Plating apparatus

Patent metadata

Field	Value
Publication number	US-10077504-B2
Application number	US-201715450873-A
Country	US
Kind code	B2
Filing date	Mar 6, 2017
Priority date	Mar 4, 2013
Publication date	Sep 18, 2018
Grant date	Sep 18, 2018

Abstract

A plating apparatus is described. The apparatus includes: a substrate holder configured to hold a substrate in a vertical position; at least one processing bath configured to process the substrate held by the substrate holder; a transporter configured to grip and horizontally transport the substrate holder; at least one lifter configured to receive the substrate holder from the transporter, lower the substrate holder to place the substrate holder in the processing bath, elevate the substrate holder from the processing bath after processing of the substrate, and transfer the substrate holder to the transporter; and a controller configured to control operations of the transporter and the lifter.

First claim

What is claimed is:

1. A plating apparatus comprising:
a substrate holder configured to hold a substrate in a vertical position;
a processing bath configured to process the substrate held by the substrate holder;
a substrate-holder tilting mechanism including
(i) a support member configured to rotatably support the substrate holder, and
(ii) an elevating actuator supporting the support member, the elevating actuator being configured to lower the support member to convert the substrate holder from the vertical position to a horizontal position and elevate the support member to convert the substrate holder from the horizontal position to the vertical position; and

a transporter having a laterally-moving arm which is separated from the support member and the elevating actuator and is horizontally movable independently of the support member and the elevating actuator, the laterally-moving arm being configured to grip the substrate holder and horizontally transport the substrate holder between the processing bath and the substrate-holder tilting mechanism.

2. The plating apparatus according to claim 1 , wherein the substrate-holder tilting mechanism further includes a laterally-moving actuator configured to move the elevating actuator horizontally.

3. The plating apparatus according to claim 1 , wherein the substrate-holder tilting mechanism further includes a slider capable of contacting a distal end of the substrate holder and capable of sliding horizontally.

4. The plating apparatus according to claim 1 , wherein the substrate-holder tilting mechanism further includes a support-member actuator configured to move the support member toward the substrate holder to establish an engagement between the support member and the substrate holder.

5. The plating apparatus according to claim 2 , wherein the elevating actuator is coupled to the laterally-moving actuator.

6. The plating apparatus according to claim 2 , wherein the elevating actuator is supported by the laterally-moving actuator.

Assignees

• Ebara Corp

Inventors

• Minami Yoshio
• Koizumi Ryuya

Classifications

• C25D21/12

  Process control or regulation (controlling or regulating in general G05) · CPC title

• C25D17/06

  Suspending or supporting devices for articles to be coated · CPC title

• C25D17/001 Primary

  Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells · CPC title

• C23C18/1675

  Process conditions · CPC title

• C23C18/163

  Supporting devices for articles to be coated · CPC title