Implementing backdrilling elimination utilizing anti-electroplate coating

US10076045B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10076045-B2
Application numberUS-201715722519-A
CountryUS
Kind codeB2
Filing dateOct 2, 2017
Priority dateJul 22, 2016
Publication dateSep 11, 2018
Grant dateSep 11, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method and structure are provided for implementing enhanced via creation without creating a via barrel stub. The need to backdrill vias during printed circuit board (PCB) manufacturing is eliminated. After the vias have been drilled, but before plating, a plug is inserted into each via and the plug is lowered to a depth just below a desired signal trace layer. A thin anti-electroplate coating is applied onto the walls of the via below the signal trace. Then the plugs are removed and a standard board plating process for the PCB is performed.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for implementing enhanced via creation without creating a via barrel stub during printed circuit board (PCB) manufacturing comprising: providing a printed circuit board (PCB); said printed circuit board (PCB) having an internal conductive trace; forming a via extending through the printed circuit board (PCB) including the internal conductive trace; and inserting a plug into the via extending from a first surface to below the internal conductive trace; applying an anti-electroplate coating covering the walls of the via below the signal trace; said anti-electroplate coating eliminating via barrel stub creation during the PCB manufacturing; and removing the plug and performing PCB plating. 2. The method as recited in claim 1 wherein applying an anti-electroplate coating covering the walls of the via below the signal trace includes applying said anti-electroplate coating by vapor deposition. 3. The method as recited in claim 1 wherein applying an anti-electroplate coating covering the walls of the via below the signal trace includes applying said anti-electroplate coating having a selected thickness in a range between 0.2 μm and 0.5 μm. 4. The method as recited in claim 1 wherein applying an anti-electroplate coating covering the walls of the via below the signal trace includes applying said anti-electroplate coating formed of a chemically resistant polymer. 5. The method as recited in claim 1 wherein applying an anti-electroplate coating covering the walls of the via below the signal trace includes applying said anti-electroplate coating formed of a hydrophobic polymer. 6. The method as recited in claim 1 wherein applying an anti-electroplate coating covering the walls of the via below the signal trace includes applying said anti-electroplate coating formed of polytetrafluoroethylene (PTFE). 7. The method as recited in claim 6 includes applying said polytetrafluoroethylene (PTFE) coating by vapor deposition. 8. The method as recited in claim 6 includes applying said polytetrafluoroethylene (PTFE) coating having a selected thickness in a range between 0.2 μm and 0.5 μm. 9. The method as recited in claim 1 wherein providing a printed circuit board (PCB); said printed circuit board (PCB) having an internal conductive trace includes a standard PCB manufacturing process. 10. The method as recited in claim 1 wherein inserting a plug into the via from a top surface extending below the internal conductive trace includes said plug blocking said anti-electroplate coating being applied to said internal conductive trace. 11. The method as recited in claim 1 wherein a standard PCB plating process is performed responsive to removing the plug. 12. The method as recited in claim 1 wherein eliminating via back-drilling enables improved yield and reliability of the PCB. 13. A printed circuit board (PCB) structure produced by a method as recited in claim 1 .

Assignees

Inventors

Classifications

  • containing halogen · CPC title

  • Via connections; Lands around holes or via connections (H05K1/112 takes precedence) · CPC title

  • Fluoropolymer, e.g. polytetrafluoroethylene [PTFE] · CPC title

  • characterised by electroplating method · CPC title

  • Treating holes before another process, e.g. coating holes before coating the substrate · CPC title

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Frequently asked questions

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What does patent US10076045B2 cover?
A method and structure are provided for implementing enhanced via creation without creating a via barrel stub. The need to backdrill vias during printed circuit board (PCB) manufacturing is eliminated. After the vias have been drilled, but before plating, a plug is inserted into each via and the plug is lowered to a depth just below a desired signal trace layer. A thin anti-electroplate coating…
Who is the assignee on this patent?
IBM
What technology area does this patent fall under?
Primary CPC classification H05K3/425. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Sep 11 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).