Chemical liquid discharge mechanism, liquid processing apparatus, chemical liquid discharge method, and storage medium

Patent metadata

Field	Value
Publication number	US-10074548-B2
Application number	US-201514795213-A
Country	US
Kind code	B2
Filing date	Jul 9, 2015
Priority date	Jul 11, 2014
Publication date	Sep 11, 2018
Grant date	Sep 11, 2018

Abstract

Disclosed is a chemical liquid discharge mechanism. The mechanism includes: a storage portion including a chemical liquid storage space; a diluent supply port opened to supply a diluent for reducing a viscosity of the chemical liquid to the storage space; a vertex flow forming portion that forms vortex flows in the diluent and the chemical liquid by supplying a fluid to the storage space to stir the diluent and the chemical liquid; and a liquid discharge port opened to an upper side of the diluent supply port in the storage space such that, by the supply of the diluent, the diluent and the chemical liquid flow into the liquid discharge port to be discharged from the storage space. Thus, the viscosity of the waste liquid discharged from the liquid discharge port may be reduced, and thus, it is not necessary to largely set the inclination of the liquid discharge path.

First claim

What is claimed is:

1. A chemical liquid discharge mechanism comprising:
a storage portion including a storage space where a chemical liquid is stored;
a vortex flow forming portion including a diluent supply port opened to a lower side of the storage space and configured to supply a diluent for reducing a viscosity of the chemical liquid to the storage space so as to form vortex flows in the diluent and to stir the diluent and the chemical liquid;
a liquid discharge port opened to an upper side of the diluent supply port in the storage space such that, by the supply of the diluent after stirring of the diluent and the chemical liquid is terminated, the diluent and the chemical liquid flow into the liquid discharge port to be discharged from the storage space;
a restraint member configured to restrain a liquid flow of the chemical liquid and the diluent in the storage space, the restraint member including a shaft member provided at a central portion of the storage space having a circular shape in plan view along a height direction of the storage space; and
a collision member formed of a net having a non-circular erected plate shape tapering in width towards its bottom that is installed to extend from the shaft member to an inner wall of the storage portion and having a plurality of holes in a surface direction thereof.

2. The chemical liquid discharge mechanism of claim 1 , wherein the storage space has a circular shape in plan view, and
the diluent supply port is configured to supply the diluent in a tangential direction of the storage space in plan view.

3. The chemical liquid discharge mechanism of claim 2 , wherein the diluent supply port is configured by a first diluent supply port and a second diluent supply port, each of which supplies the diluent in the tangential direction of the storage space so that vortex flows are formed in reverse directions in the storage space in plan view, and
the diluent is alternately supplied from the first diluent supply port and the second diluent supply port.

4. The chemical liquid discharge mechanism of claim 2 , further comprising:
a control unit programmed to control a flow rate of the diluent supply port such that a processing period in which the diluent is supplied at a first flow rate that forms the vortex flows and a waiting period in which the diluent is supplied at a second flow rate lower than the first flow rate are repeated.

5. The chemical liquid discharge mechanism of claim 1 , wherein the storage space has a circular shape in plan view, and
the vortex flow forming portion further includes a gas supply port that supplies a gas in a tangential direction of the storage space in plan view.

6. The chemical liquid discharge mechanism of claim 5 , wherein the vortex flow forming portion is configured by the gas supply port and the diluent supply port, and
formation of vortex flows by the supply of the diluent and the gas and formation of vortex flows by the supply of the gas without the supply of the diluent are alternately and repeatedly performed.

7. A liquid processing apparatus comprising:
a mounting unit configured to mount a substrate thereon;
a chemical liquid supply unit configured to supply a chemical liquid to the substrate mounted on the mounting unit so as to perform a processing;
a cup configured to surround the substrate mounted on the mounting unit; and
a chemical liquid discharge mechanism of claim 1 ,
wherein the storage portion of the chemical liquid discharge mechanism is installed at a lower side of the cup such that the chemical liquid is discharged from a liquid discharge path provided in a bottom portion of the cup to the storage portion.

8. A liquid processing apparatus comprising:
a mounting unit configured to mount a substrate thereon;
a chemical liquid supply unit configured to supply a chemical liquid to the substrate mounted on the mounting unit so as to perform a processing; and
a chemical liquid discharge mechanism of claim 1 ,
wherein the storage portion of the chemical liquid discharge mechanism forms a liquid receiving portion that receives the chemical liquid supplied from the chemical liquid supply unit at the outside of the substrate.

9. The liquid processing apparatus of claim 8 , wherein the diluent is a solvent of the chemical liquid,
the liquid receiving portion is configured by a first chemical liquid discharge mechanism and a second chemical liquid discharge mechanism,
a gas discharge mechanism is provided to evacuate the storage space from a liquid discharge port for only one chemical liquid discharge mechanism among the first chemical liquid discharge mechanism and the second chemical liquid discharge mechanism, and
an upper side of the storage space in another chemical liquid discharge mechanism among the first chemical liquid discharge mechanism and the second chemical liquid discharge mechanism forms a waiting region of a solvent atmosphere where the chemical liquid supply unit waits.

10. A chemical liquid discharge method comprising:
storing a chemical liquid in a chemical liquid storage space provided in a storage portion;
supplying a diluent for reducing a viscosity of the chemical liquid from a diluent supply port opened to a lower side of the storage space so as to form vortex flows in the diluent and to stir the diluent and the chemical liquid; and
after stirring of the diluent and the chemical liquid is terminated, causing, by the supply of the diluent, the diluent and the chemical liquid to flow into a liquid discharge port opened to an upper side of the diluent supply port to be discharged from the storage space,
wherein a restraint member is configured to restrain a liquid flow of the chemical liquid and the diluent in the storage space and includes a shaft member provided at a central portion of the storage space having a circular shape in plan view along a height direction of the storage space, and
a collision member is formed of a net having a non-circular erected plate shape tapering in width towards its bottom that is installed to extend from the shaft member to an inner wall of the storage portion and having a plurality of holes in a surface direction thereof.

11. The chemical liquid discharge method of claim 10 , wherein the storage space has a circular shape in plan view, and
the forming the vortex flows includes supplying the diluent from the diluent supply port in a tangential direction of the storage space in plan view.

12. The chemical liquid discharge method of claim 11 , wherein the forming the vortex flows includes alternately supplying the diluent from a first supply port and a second supply port that form the diluent supply port so that the vortex flows are formed in reverse directions.

13. The chemical liquid discharge method of claim 11 , wherein the forming the vortex flows includes: supplying the diluent from the diluent supply port at a first flow rate forming the vortex flows, and supplying the diluent from the diluent supply port at a second flow rate lower than the first flow rate, which are alternately and repeatedly performed.

14. The chemical liquid discharge method of claim 10 , wherein the storage space has a circular shape in plan view, and
the forming the vortex flows includes supplying a gas in a tangential direction of the storage space in plan view.

15. The chemical liquid discharge method of claim 14 , wherein the forming the vortex flows includes: forming vortex flows by supplying the gas and the diluent in the tangential direction of the storage space in plan view, and forming vortex flows by supplying the gas without supplying the dilue

Assignees

• Tokyo Electron Ltd

Inventors

• Sasagawa Norihiko
• Inada Hiroichi
• Hamada Masahito

Classifications

• H10P72/0448 Primary

  Apparatus for applying a liquid, a resin, an ink or the like · CPC title

• H10P72/0402 Primary

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• G03F7/3021

  from a wafer supported on a rotating chuck · CPC title

• H01L21/6715 Primary

  Electricity · mapped topic

• B01F15/00889

  Operations & Transport · mapped topic