Calibration apparatus and calibration method

Patent metadata

Field	Value
Publication number	US-10071458-B2
Application number	US-201615353913-A
Country	US
Kind code	B2
Filing date	Nov 17, 2016
Priority date	Nov 27, 2015
Publication date	Sep 11, 2018
Grant date	Sep 11, 2018

Abstract

An object of the invention is to provide a calibration apparatus which enables the pressing force of the polishing pad to be adjusted by a simple method without the need of removing a stage on which a substrate can be placed. One embodiment of the invention provides a calibration apparatus for a bevel polishing system for polishing a bevel portion of a substrate, comprising: a load measuring device capable of measuring a pressing load from a polishing pad of the bevel polishing system; and a base plate capable of having the load measuring device placed thereon, wherein the base plate is capable of being fixed on a vacuum suction table which is capable of having a substrate placed thereon.

First claim

What is claimed is:

1. A calibration apparatus for use in a bevel polishing apparatus, the bevel polishing apparatus being configured to polish a bevel portion of a substrate, said calibration apparatus comprising:
a load measuring device configured to measure a pressing load from a polishing pad of the bevel polishing apparatus; and
a base plate configured to be fixed on a vacuum suction table configured to hold the substrate placed thereon, the base plate having the load measuring device placed thereon.

2. The calibration apparatus according to claim 1 , wherein the load measuring device includes a force gauge having a measuring shaft.

3. The calibration apparatus according to claim 2 , wherein the load measuring device includes a load bearing member configured to be fixed to the measuring shaft of the force gauge, the load bearing member including a load bearing surface configured to receive the pressing load.

4. The calibration apparatus according to claim 3 , further comprising a spacer configured to adjust a position of the load bearing surface relative to the vacuum suction table.

5. The calibration apparatus according to claim 3 , wherein the load bearing member includes a bracket.

6. The calibration apparatus according to claim 5 , wherein the load bearing member includes a pad formed by a resin and adapted to be fixed to the bracket.

7. The calibration apparatus according to claim 1 , wherein the load measuring device includes a mounting plate, the mounting plate being configured to be fixed to the base plate.

8. The calibration apparatus according to claim 7 , wherein the mounting plate includes an adjustment screw configured to adjust a position of the mounting plate relative to the base plate.

9. A bevel polishing apparatus configured to polish a bevel portion of a substrate, the bevel polishing apparatus comprising:
a vacuum suction table configured to hold a substrate placed thereon;
a plurality of polishing heads arranged along an outer periphery of the vacuum suction table, each polishing head of the plurality of polishing heads including a polishing pad adapted to be pressed toward a bevel portion of the substrate; and
a calibration apparatus, the calibration apparatus including:
a load measuring device configured to measure a pressing load from a polishing pad of the bevel polishing apparatus; and
a base plate configured to be fixed on a vacuum suction table configured to hold the substrate placed thereon, the base plate having the load measuring device placed thereon.

10. The bevel polishing apparatus according to claim 9 , wherein the load measuring device includes a force gauge having a measuring shaft.

11. The bevel polishing apparatus according to claim 10 , wherein the load measuring device includes a load bearing member configured to be fixed to the measuring shaft of the force gauge, the load bearing member including a load bearing surface configured to receive the pressing load.

12. The bevel polishing apparatus according to claim 11 , wherein the calibration apparatus further comprises a spacer configured to adjust a position of the load bearing surface relative to the vacuum suction table.

13. The bevel polishing apparatus according to claim 11 , wherein the load bearing member includes a bracket.

14. The bevel polishing apparatus according to claim 13 , wherein the load bearing member includes a pad formed by a resin and adapted to be fixed to the bracket.

15. The bevel polishing apparatus according to claim 9 , wherein the load measuring device includes a mounting plate configured to be fixed to the base plate.

16. The bevel polishing apparatus according to claim 15 , wherein the mounting plate includes an adjustment screw configured to adjust a position of the mounting plate relative to the base plate.

17. A calibration method for a bevel polishing apparatus, comprising the steps of:
providing a bevel polishing apparatus configured to polish a bevel portion of a substrate, the bevel polishing apparatus including: a vacuum suction table configured to hold the substrate placed thereon; and a plurality of polishing heads arranged along an outer periphery of the vacuum suction table, each polishing head of the plurality of polishing heads including a polishing pad adapted to be pressed toward the bevel portion of the substrate;
sucking a base plate onto the vacuum suction table, the base plate being configured to have a load measuring device placed thereon;
fixing the load measuring device to the base plate;
rotating the vacuum suction table so as to position the load measuring device relative to the polishing head;
applying a pressing force from the polishing pad to a load bearing surface of the load measuring device; and
obtaining a correlation between a measured value of the load measuring device when the pressing force is applied and a set load of the polishing head.

18. The calibration method according to claim 17 , wherein the step of fixing the load measuring device to the base plate includes a step of providing a spacer between the load bearing surface of the load measuring device and the base plate, to thereby adjust a position of the load bearing surface relative to the vacuum suction table.

19. The calibration method according to claim 18 , wherein the step of sucking the base plate onto the vacuum suction table includes temporarily fixing a mounting plate of the load measuring device to the base plate.

Assignees

• Ebara Corp

Inventors

• Yazawa Akihiro
• Kobayashi Kenichi

Classifications

• B24B41/02

  Frames; Beds; Carriages · CPC title

• B24B49/00

  Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation (B24B33/06, B24B37/005 take precedence; if applicable to other machine tools, B23Q15/00 - B23Q17/00 take precedence) · CPC title

• B24B37/005 Primary

  Control means for lapping machines or devices · CPC title

• B24B9/065

  of thin, brittle parts, e.g. semiconductors, wafers · CPC title

• B24B21/006 Primary

  for special purposes, e.g. for television tubes, car bumpers · CPC title