Method of manufacturing pellicle assembly and method of photomask assembly including the same

US10065402B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10065402-B2
Application numberUS-201615014054-A
CountryUS
Kind codeB2
Filing dateFeb 3, 2016
Priority dateJun 4, 2015
Publication dateSep 4, 2018
Grant dateSep 4, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method of manufacturing a pellicle assembly, the method including attaching a carbon-containing thin film onto a transfer membrane in a wet atmosphere; attaching the carbon-containing thin film to a pellicle frame in a dry atmosphere while the carbon-containing thin film is attached onto the transfer membrane; and separating the transfer membrane from the carbon-containing thin film while the carbon-containing thin film is attached to the pellicle frame.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of manufacturing a pellicle assembly, the method comprising: temporarily attaching a carbon-containing thin film onto a transfer membrane using a liquid in a wet atmosphere, wherein attaching the carbon-containing thin film onto the transfer membrane in the wet atmosphere includes dipping the carbon-containing thin film in the liquid, and attaching the carbon-containing thin film onto the transfer membrane while at least a portion of the carbon-containing thin film is dipped in the liquid; attaching the carbon-containing thin film to a pellicle frame in a dry atmosphere while the carbon-containing thin film is attached onto the transfer membrane; and separating the transfer membrane from the carbon-containing thin film while the carbon-containing thin film is attached to the pellicle frame. 2. The method as claimed in claim 1 , further comprising, after separating the transfer membrane from the carbon-containing thin film, drying the carbon-containing thin film. 3. The method as claimed in claim 1 , further comprising, before attaching the carbon-containing thin film onto the transfer membrane or after separating the transfer membrane from the carbon-containing thin film, decreasing a thickness of the carbon-containing thin film. 4. The method as claimed in claim 3 , wherein decreasing the thickness of the carbon-containing thin film is performed using a plasma etching process performed in an oxygen or hydrogen atmosphere. 5. The method as claimed in claim 1 , wherein attaching the carbon-containing thin film onto the transfer membrane includes attaching the carbon-containing thin film onto the transfer membrane using a surface tension and a capillary phenomenon of the liquid. 6. The method as claimed in claim 1 , wherein: the transfer membrane includes a plurality of pores penetrating the transfer membrane, and each of the plurality of pores has an average pore size of about 10 nm to about 20 and wherein at least one of the plurality of pores is filled with the liquid. 7. The method as claimed in claim 1 , wherein the transfer membrane includes a transparent film or a translucent film. 8. The method as claimed in claim 1 , wherein the transfer membrane includes a porous polymer film. 9. A method of manufacturing a pellicle assembly, the method comprising: forming a handling thin film on a first surface of a carbon-containing thin film; temporarily attaching the carbon-containing thin film onto a transfer membrane using a liquid in a wet atmosphere, while maintaining the handling thin film on the carbon-containing thin film, wherein attaching the carbon-containing thin film onto the transfer membrane in the wet atmosphere includes dipping the carbon-containing thin film in the liquid, and attaching the carbon-containing thin film onto the transfer membrane while at least a portion of the carbon-containing thin film is dipped in the liquid; attaching the carbon-containing thin film to a pellicle frame in a dry atmosphere while the carbon-containing thin film is attached onto the transfer membrane; separating the transfer membrane from the carbon-containing thin film while the carbon-containing thin film is attached to the pellicle frame; and removing at least a portion of the handling thin film. 10. The method as claimed in claim 9 , wherein forming the handling thin film includes coating a polymer film on the first surface of the carbon-containing thin film. 11. The method as claimed in claim 9 , wherein attaching the carbon-containing thin film onto the transfer membrane includes attaching the carbon-containing thin film onto the transfer membrane such that the transfer membrane faces the first surface of the carbon-containing thin film with the handling thin film between the transfer membrane and the first surface of the carbon-containing thin film. 12. The method as claimed in claim 9 , wherein attaching the carbon-containing thin film onto the transfer membrane includes attaching the carbon-containing thin film onto the transfer membrane such that the transfer membrane faces a second surface of the carbon-containing thin film, the second surface of the carbon-containing thin film being opposite to the first surface of the carbon-containing thin film. 13. The method as claimed in claim 9 , wherein attaching the carbon-containing thin film onto the transfer membrane is performed using a surface tension and a capillary phenomenon of the liquid. 14. The method as claimed in claim 9 , wherein removing at least the portion of the handling thin film is performed using a plasma etching process performed in an oxygen or hydrogen atmosphere. 15. A method of manufacturing a pellicle assembly, the method comprising: temporarily attaching a carbon-containing thin film onto a transfer membrane using a liquid in a liquid environment, wherein attaching the carbon-containing thin film onto the transfer membrane in the liquid environment includes dipping the carbon-containing thin film in the liquid, and attaching the carbon-containing thin film onto the transfer membrane while at least a portion of the carbon-containing thin film is dipped in the liquid; attaching the carbon-containing thin film onto one surface of a pellicle frame in a gas environment while the carbon-containing thin film is attached onto the transfer membrane, separating the transfer membrane from the carbon-containing thin film while the carbon-containing thin film is attached onto the pellicle frame, and fixing a photomask to another surface of the pellicle frame. 16. The method as claimed in claim 15 , further comprising, before attaching the carbon-containing thin film onto the transfer membrane, forming a handling thin film on the carbon-containing thin film, wherein attaching carbon-containing thin film onto the transfer membrane includes attaching the carbon-containing thin film onto the transfer membrane while the carbon-containing thin film is spaced apart from the transfer membrane with the handling thin film between the carbon-containing thin film and the transfer membrane. 17. The method as claimed in claim 16 , further comprising, after separating the transfer membrane from the carbon-containing thin film, removing the handling thin film from the carbon-containing thin film. 18. The method as claimed in claim 15 , further comprising, after separating the transfer membrane from the carbon-containing thin film, decreasing a thickness of the carbon-containing thin film. 19. The method as claimed in claim 15 , wherein: the transfer membrane includes a plurality of pores, and attaching the carbon-containing thin film onto the transfer membrane includes attaching the carbon-containing thin film onto the transfer membrane using a surface tension and a capillary phenomenon of the liquid.

Assignees

Inventors

Classifications

  • Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass · CPC title

  • Removing moisture · CPC title

  • characterised by the properties of the layers · CPC title

  • PCBs, i.e. printed circuit boards · CPC title

  • B32B37/025Primary

    Transfer laminating · CPC title

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What does patent US10065402B2 cover?
A method of manufacturing a pellicle assembly, the method including attaching a carbon-containing thin film onto a transfer membrane in a wet atmosphere; attaching the carbon-containing thin film to a pellicle frame in a dry atmosphere while the carbon-containing thin film is attached onto the transfer membrane; and separating the transfer membrane from the carbon-containing thin film while the…
Who is the assignee on this patent?
Samsung Electronics Co Ltd, Research & Business Foundation Sungkyunk Wan Univ
What technology area does this patent fall under?
Primary CPC classification B32B37/025. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Sep 04 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).