Gas injection system for ion beam device

Patent metadata

Field	Value
Publication number	US-10062548-B2
Application number	US-201514840531-A
Country	US
Kind code	B2
Filing date	Aug 31, 2015
Priority date	Aug 31, 2015
Publication date	Aug 28, 2018
Grant date	Aug 28, 2018

Abstract

A gas injection system for an ion beam device, the gas injection system including an extraction plate, an extraction aperture formed in the extraction plate for allowing passage of an ion beam, a first gas distributor removably fastened to the extraction plate on a first side of the extraction aperture, the first gas distributor having a gas orifice formed therein, a second gas distributor removably fastened to the extraction plate on a second side of the extraction aperture opposite the first side, the second gas distributor having a gas orifice formed therein, a first gas conduit extending through the extraction plate between the first gas distributor and a gas manifold mounted to the extraction plate, and a second gas conduit extending through the extraction plate between the second gas distributor the gas manifold, and a residue removal gas source connected to the gas manifold.

First claim

The invention claimed is:

1. A gas injection system for an ion beam device, the gas injection system comprising:
an extraction plate having an aperture for allowing passage of an ion beam through the extraction plate; and
a gas distributor disposed within a recess formed in the extraction plate and removably coupled to the extraction plate, the gas distributor having a gas orifice formed therein;
the extraction plate having a gas conduit extending through an interior thereof, the gas conduit in fluid communication with the recess for supplying gas to the recess.

2. The gas injection system of claim 1 , wherein the gas conduit extends between the recess and a gas manifold mounted to the extraction plate.

3. The gas injection system of claim 2 , further comprising a gas source connected in fluid communication with the gas manifold, the gas source containing a residue removal gas.

4. The gas injection system of claim 1 , wherein the gas distributor is a first gas distributor, and wherein the extraction plate further comprises a second gas distributor, the second gas distributor having a gas orifice formed therein.

5. The gas injection system of claim 4 , wherein the first gas distributor is located on a first side of the extraction aperture and the second gas distributor is located on a second side of the extraction aperture opposite the first side.

6. The gas injection system of claim 5 , further comprising a first gas conduit extending through the extraction plate between the first gas distributor and a gas manifold mounted to the extraction plate, and a second gas conduit extending through the extraction plate between the second gas distributor and the gas manifold.

7. The gas injection system of claim 6 , further comprising a gas source connected in fluid communication with the gas manifold, the gas source containing a residue removal gas.

8. The gas injection system of claim 5 , further comprising a first gas conduit extending through the extraction plate between the first gas distributor and a first gas manifold mounted to the extraction plate, and a second gas conduit extending through the extraction plate between the second gas distributor and a second gas manifold mounted to the extraction plate.

9. The gas injection system of claim 8 , further comprising a first gas source connected in fluid communication with the first gas manifold, the first gas source containing a first residue removal gas, and a second gas source connected in fluid communication with the second gas manifold, the second gas source containing a second residue removal gas.

10. A gas injection system for an ion beam device, the gas injection system comprising:
an extraction plate having an extraction aperture for allowing passage of an ion beam through the extraction plate;
a first gas distributor disposed within a first recess formed in the extraction plate and removably fastened to the extraction plate on a first side of the extraction aperture, the first gas distributor having a gas orifice formed therein;
a second gas distributor disposed within a second recess formed in the extraction plate and removably fastened to the extraction plate on a second side of the extraction aperture opposite the first side, the second gas distributor having a gas orifice formed therein;
a first gas conduit extending through the extraction plate between the first gas distributor and a gas manifold mounted to the extraction plate, and a second gas conduit extending through the extraction plate between the second gas distributor the gas manifold; and
a gas source connected in fluid communication with the gas manifold, the gas source containing a residue removal gas.

Assignees

• Varian Semiconductor Equipment Ass Inc

Inventors

• Wallace Jay
• Allen Ernest
• Hertel Richard
• Daniels Kevin
• Gilchrist Glen

Classifications

• H10P72/7618

  characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

• H01J2237/006

  Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece, (H01J37/3244 takes precedence; environmental cells for electron microscopes H01J2237/2003; microscopes with environmental specimen chamber H01J2237/2608) · CPC title

• H01J37/3056

  for microworking, e. g. etching of gratings or trimming of electrical components · CPC title

• H01J2237/20228

  Mechanical X-Y scanning · CPC title

• H01J37/3244 Primary

  Gas supply means · CPC title