Copper alloy for electronic device, method for producing copper alloy for electronic device, and copper alloy rolled material for electronic device

US10056165B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10056165-B2
Application numberUS-201113695666-A
CountryUS
Kind codeB2
Filing dateMay 13, 2011
Priority dateMay 14, 2010
Publication dateAug 21, 2018
Grant dateAug 21, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

This copper alloy for an electronic device is composed of a binary alloy of Cu and Mg which is composed of Mg at a content of 3.3 to 6.9 atomic %, and a remainder of Cu and inevitable impurities, and a conductivity σ (% IACS) is within the following range when the content of Mg is given as A atomic %, and/or an average number of intermetallic compounds having grain sizes of 0.1 μm or more is in a range of 1/μm 2 or less, σ≤{1.7241/(−0.0347× A 2 +0.6569× A +1.7)}×100.

First claim

Opening claim text (preview).

The invention claimed is: 1. A copper alloy for an electronic device, wherein the copper alloy is composed of a binary alloy of Cu and Mg, the binary alloy consists of Mg at a content in a range of 3.3 to 6.9 atomic %, and a remainder of Cu and inevitable impurities, a conductivity σ (% IACS) is within the following range when the content of Mg is given as A atomic %, σ≤{1.7241/(−0.0347× A 2 +0.6569× A+ 1.7)}×100, the copper alloy is subjected to hot working, cold working, or warm working, and the copper alloy substantially consists of a Cu—Mg solid solution alloy supersaturated with Mg. 2. The copper alloy for an electronic device according to claim 1 , wherein a Young's modulus E is in a range of 125 GPa or less, and a 0.2% proof stress σ 0.2 is in a range of 400 MPa or more. 3. A method for producing the copper alloy for an electronic device according to claim 1 , the method comprising: a heating process of heating a copper material composed of a binary alloy of Cu and Mg to a temperature of 500 to 900° C., wherein the binary alloy consists of Mg at a content in a range of 3.3 to 6.9 atomic %, and a remainder of Cu and inevitable impurities; a rapid cooling process of cooling the heated copper material at a cooling rate of 200° C./min or more to a temperature of 200° C. or lower; and a working process of working the rapidly cooled copper material, whereby obtaining the copper alloy according to claim 1 . 4. A rolled copper alloy for an electronic device, which is composed of the copper alloy for an electronic device according to claim 2 , wherein the rolled copper alloy is used as a copper material that constitutes a terminal, a connector, or a relay.

Assignees

Inventors

Classifications

  • of copper or alloys based thereon · CPC title

  • with zinc as the next major constituent · CPC title

  • by melting {(C22C1/1036 takes precedence)} · CPC title

  • H01B1/026Primary

    Alloys based on copper · CPC title

  • using master alloys · CPC title

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What does patent US10056165B2 cover?
This copper alloy for an electronic device is composed of a binary alloy of Cu and Mg which is composed of Mg at a content of 3.3 to 6.9 atomic %, and a remainder of Cu and inevitable impurities, and a conductivity σ (% IACS) is within the following range when the content of Mg is given as A atomic %, and/or an average number of intermetallic compounds having grain sizes of 0.1 μm or more is in…
Who is the assignee on this patent?
Ito Yuki, Maki Kazunari, Mitsubishi Materials Corp
What technology area does this patent fall under?
Primary CPC classification H01B1/026. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Aug 21 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).