Real-time variable parameter micro-nano optical field modulation system and interference lithography system

Patent metadata

Field	Value
Publication number	US-10054859-B2
Application number	US-201615310245-A
Country	US
Kind code	B2
Filing date	Jan 6, 2016
Priority date	Jan 6, 2016
Publication date	Aug 21, 2018
Grant date	Aug 21, 2018

Abstract

A real-time variable parameter micro-nano optical field modulation system includes a light source, a 4F optical system and a set of light wave modulation optical components. The 4F optical system includes a first optical assembly and a second optical assembly arranged along an optical path in sequence. The light wave modulation optical components are arranged between the first optical assembly and the second optical assembly, and generate optical field distribution with adjustable patterns and structural parameters thereof on a back focal plane of the system by segmented modulation of sub-wavefronts.

First claim

What is claimed is:

1. A real-time variable parameter micro-nano optical field modulation system, comprising:
a coherent light source that generates parallel lights,
a 4F optical system, and
a set of light wave modulation optical components,
wherein the 4F optical system includes a first optical assembly and a second optical assembly arranged along an optical path in sequence;
wherein the light wave modulation optical components are arranged between the first optical assembly and the second optical assembly, and generate an optical field distribution with adjustable patterns and structural parameters thereof on a back focal plane of the system by segmented modulation of sub-wavefronts; and
wherein the light wave modulation optical components comprise a plurality of sub-elements, for realizing the optical field modulation of the sub-wavefronts by selecting different sub-elements and/or different combinations thereof, and generate the optical field distribution of different patterns on the back focal plane of the system; and the sub-elements realize the optical field modulation of the respective sub-wavefronts by means of changes in displacement and/or rotation, and generate the optical field distribution with adjustable structural parameters on the back focal plane of the system.

2. The real-time variable parameter micro-nano optical field modulation system according to claim 1 , wherein the structural parameters comprise a period, an orientation, a phase or phase shift amount, and a duty cycle.

3. The real-time variable parameter micro-nano optical field modulation system according to claim 1 , wherein the optical field distribution is an interference pattern.

4. The real-time variable parameter micro-nano optical field modulation system according to claim 1 , wherein the structural parameters are continuously adjustable in real time, separately or synchronously.

5. The real-time variable parameter micro-nano optical field modulation system according to claim 1 , wherein the first optical assembly and the second optical assembly are lenses, lens sets or metasurface and micro-nano structures which have the same optical performance.

6. The real-time variable parameter micro-nano optical field modulation system according to claim 1 , wherein the sub-elements are selected from the group consisting of phase elements, binary optical elements, grating elements, holographic elements, reflective elements, refractive elements and metasurface elements.

7. The real-time variable parameter micro-nano optical field modulation system according to claim 1 , wherein the set of light wave modulation optical components comprises multiple stages of subsets of devices in the direction of the optical path, each of said stages comprising at least one of the sub-elements, wherein the subset of devices located at the next stage is used for real-time modulation of the sub-wavefront of the wavefront that is modulated in the previous stage.

8. The real-time variable parameter micro-nano optical field modulation system according to claim 1 , wherein the set of optical components further comprises one or more combinations of an adjustable diaphragm, a gray-scale mask, and a polarization conversion element.

9. The real-time variable parameter micro-nano optical field modulation system according to claim 1 , wherein the light source comprises a laser.

10. An interference lithography system for a micro-nano structure, comprising the real-time variable parameter micro-nano optical field modulation system according to claim 1 .

Assignees

• Univ Soochow

Inventors

• Ye Yan
• Xu Fengchuan
• Wei Guojun
• Xu Yishen
• Pu Donglin
• Chen Linsen

Classifications

• G02B27/0944

  Diffractive optical elements, e.g. gratings, holograms (gratings per se G02B5/18; holograms used as optical elements per se G02B5/32) · CPC title

• G03F7/7045 Primary

  Hybrid exposures, i.e. multiple exposures of the same area using different types of exposure apparatus, e.g. combining projection, proximity, direct write, interferometric, UV, x-ray or particle beam · CPC title

• G02B27/4222

  in projection exposure systems, e.g. photolithographic systems · CPC title

• G02B27/0977

  Reflective elements · CPC title

• G02B27/0988

  Diaphragms, spatial filters, masks for removing or filtering a part of the beam · CPC title