Multi charged particle beam writing apparatus and multi charged particle beam writing method

Patent metadata

Field	Value
Publication number	US-9934935-B2
Application number	US-201615225969-A
Country	US
Kind code	B2
Filing date	Aug 2, 2016
Priority date	Aug 11, 2015
Publication date	Apr 3, 2018
Grant date	Apr 3, 2018

Abstract

A multi charged particle beam writing apparatus includes a maximum irradiation time acquisition processing circuitry to acquire, for each shot of multi-beams, a maximum irradiation time of irradiation time of each of the multi-beams, a unit region writing time calculation processing circuitry to calculate, using the maximum irradiation time for each shot, a unit region writing time by totalizing the maximum irradiation time of each shot of a plurality of times of shots of the multi-beams which irradiate a unit region concerned during stage moving, for each unit region of a plurality of unit regions obtained by dividing a writing region of a target object, a stage speed calculation processing circuitry to calculate speed of the stage for each unit region so that the stage speed becomes variable, by using the unit region writing time and a stage control processing circuitry to variably control the stage speed.

First claim

What is claimed is:

1. A multi charged particle beam writing apparatus comprising:
a writing mechanism configured to include a stage, being movable, for mounting a target object serving as a writing target thereon, and to write a pattern on the target object with multi-beams of a charged particle beam;
a maximum irradiation time acquisition processing circuitry configured to acquire, for each shot of the multi-beams, a maximum irradiation time of irradiation time of each beam of the multi-beams;
a unit region writing time calculation processing circuitry configured to calculate, using the maximum irradiation time for the each shot, a unit region writing time by totalizing the maximum irradiation time of the each shot of a plurality of times of shots of the multi-beams which irradiate a unit region concerned while the stage is moved, for each unit region of a plurality of unit regions obtained by dividing a writing region of the target object;
a stage speed calculation processing circuitry configured to calculate a speed of the stage for the each unit region so that the speed of the stage becomes variable, by using the unit region writing time; and
a stage control processing circuitry configured to variably control the speed of the stage.

2. The apparatus according to claim 1 , wherein a reference position of an irradiatable region which one-time shot of the multi-beams is able to irradiate overlaps with a unit region of the plurality of unit regions, and each shot of the multi-beams belongs as a part to the plurality of times of shots of the multi-beams to irradiate the unit region with which the reference position of a corresponding shot overlaps.

3. The apparatus according to claim 1 , wherein the plurality of times of shots are performed by the multi-beams each having a different maximum irradiation time while a position of the each beam is shifted in a state where the irradiatable region is set on the target object.

4. The apparatus according to claim 1 , wherein
the each shot of the multi-beams is divided into a plurality of times of divided shots to continuously irradiate a same position, and
a number of times of the plurality of times of divided shots is variably set according to the pattern written on the target object.

5. The apparatus according to claim 1 , wherein the writing mechanism performs the plurality of times of shots of the multi-beams such that a time period of switching one of the plurality of times of shots to a next one of the plurality of times of shots is variable according to the maximum irradiation time of the each shot of the multi-beams.

6. The apparatus according to claim 5 , wherein the writing mechanism eliminates a time exceeding the maximum irradiation time of the each shot in a settable maximum irradiation time settable for one-time shot of the multi-beams so as to perform a next shot of the multi-beams.

7. The apparatus according to claim 1 , wherein the each shot of the multi-beams is divided into a plurality of times of divided shots to continuously irradiate a same position, further comprising:
a divided shot data generation processing circuitry configured to generate, for the each beam of the multi-beams, divided shot data so that a group of divided shots, by which an irradiation time needed for an irradiation position is obtained, is selected from the plurality of times of divided shots.

8. The apparatus according to claim 7 , further comprising:
an eliminating processing circuitry configured to eliminate, for the each shot of the multi-beams, a period of a divided shot which has not been selected by any beam of the multi-beams.

9. A multi charged particle beam writing method comprising:
acquiring, for each shot of multi-beams of a charged particle beam, a maximum irradiation time of irradiation time of each beam of the multi-beams;
calculating, using the maximum irradiation time for the each shot, a unit region writing time by totalizing the maximum irradiation time of the each shot of a plurality of times of shots of the multi-beams to irradiate a unit region concerned while moving a stage on which a target object is placed, for each unit region of a plurality of unit regions obtained by dividing a writing region of the target object to be written;
calculating a speed of the stage for the each unit region by using the unit region writing time so that the speed of the stage becomes variable; and
writing a pattern on the target object with the multi-beams of the charged particle beam while variably controlling the speed of the stage.

10. A multi charged particle beam writing method comprising:
writing a pattern on a target object with multi-beams of a charged particle beam while variably controlling a speed of a stage;
such that the speed of the stage on which the target object is placed is controlled at high speed when writing a region on the target object of high pattern density of the pattern to be written; and
such that the speed of the stage is controlled at low speed when writing a region on the target object of low pattern density.

Assignees

• Nuflare Technology Inc

Inventors

• Yoshikawa Ryoichi
• Inoue Hideo
• Kimura Hayato
• Kato Yasuo
• Yashima Jun

Classifications

• H01J37/045

  Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge · CPC title

• H01J37/20 Primary

  Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support · CPC title

• H01J2237/0453

  multiple apertures · CPC title

• H01J2237/20292

  Means for position and/or orientation registration · CPC title

• G03F7/70766

  Reaction force control means, e.g. countermass · CPC title