Beam pattern synthesis for metamaterial antennas

Patent metadata

Field	Value
Publication number	US-10050344-B2
Application number	US-201514954726-A
Country	US
Kind code	B2
Filing date	Nov 30, 2015
Priority date	Nov 30, 2015
Publication date	Aug 14, 2018
Grant date	Aug 14, 2018

Abstract

A determined object wave can be approximately formed by applying a modulation pattern to metamaterial elements receiving RF energy from a feed network. For example, a desired object wave at a surface of an antenna is selected to be propagated into a far-field pattern. A computing system can compute an approximation of the object wave by calculating a modulation pattern to apply to metamaterial elements receiving RF energy from a feed network. The approximation can be due to a grid size of the metamaterial elements. Once the modulation pattern is determined, it can be applied to the metamaterial elements and the RF energy can be provided in the feed network, causing emission of the approximated object wave from the antenna.

First claim

What is claimed is:

1. An antenna system comprising:
a feed network comprising a feed input port configured to provide a reference wave;
an aperture coupled to the feed network and approximated by an aperture taper function, the aperture comprising a set of radiating aperture elements having an element modulation range and configured to selectively transfer energy from the reference wave, the set of radiating aperture elements configured to radiate a beam pattern based on energy received from the reference wave; and
a processor configured to:
select an antenna-plane pattern;
determine an ideal holographic modulation pattern from the reference wave and the antenna-plane pattern;
multiply the aperture taper function with the ideal holographic modulation pattern;
discard a phase portion of the ideal holographic modulation pattern and retain a magnitude of the ideal holographic modulation pattern to form a real modulation pattern;
shift and scale the elements of the real modulation pattern to lie within the upper and lower bounds of the element modulation range to form an aperture modulation pattern; and
apply the aperture modulation pattern created using the magnitude of the ideal holographic modulation pattern by discarding the phase portion of the ideal holographic modulation pattern to the aperture to approximate the selected antenna-plane pattern in the beam pattern radiated by the aperture using the energy received from the reference wave.

2. The system of claim 1 , wherein the reference wave is propagating through a transmission line structure.

3. The system of claim 1 , wherein the reference wave further comprises a set of fields in the feed network.

4. The system of claim 1 , wherein the antenna system further comprises metamaterial surface antenna technology (MSA-T).

5. The system of claim 4 , wherein the set of radiating aperture elements further comprises metamaterial elements.

6. The system of claim 4 , wherein the set of radiating aperture elements comprises sub-wavelength antenna elements, each configured to emit an electromagnetic emission in response to received electromagnetic energy, wherein each of the sub-wavelength antenna elements comprises at least one electromagnetically resonant element, and wherein a physical diameter of individual sub-wavelength antenna elements is less than an effective wavelength of the electromagnetic emission.

7. The system of claim 1 , wherein to apply the aperture modulation pattern to the aperture further comprises to modulate an impedance of the aperture in electromagnetic contact with the reference wave.

8. The system of claim 1 , wherein the aperture modulation pattern causes a sampled approximation of the selected antenna-plane pattern.

9. The system of claim 1 , wherein to select the antenna-plane pattern further comprises:
define a two-dimensional far-field beam pattern; and
back-propagate the two-dimensional far-field beam pattern to an antenna plane.

10. A system for beam shaping, the system comprising:
storage configured for storing an aperture taper function and an element modulation range of an aperture; and
a processor configured to:
determine an ideal modulation pattern based at least in part on a reference wave from a feed network of an antenna multiplied by an antenna-plane pattern;
multiply the aperture taper function with the ideal modulation pattern;
retain a magnitude portion of the ideal modulation pattern to form a real modulation pattern;
form an aperture modulation pattern by shifting or scaling the real modulation pattern to fit within a lower bound of the element modulation range of the aperture and an upper bound of the element modulation range of the aperture; and
determine an aperture plane pattern of the aperture based at least in part on a product of the aperture modulation pattern created using the magnitude portion of the ideal holographic modulation pattern and the reference wave, the aperture plane pattern used to configure the aperture to radiate a beam pattern according to the antenna-plane pattern using energy received from the reference wave.

11. The device of claim 10 , wherein the processor is further configured to apply the aperture plane pattern of the aperture to an antenna system aperture.

12. The device of claim 11 , wherein to apply the aperture plane pattern to the antenna system aperture further comprises to modulate an impedance of the antenna system aperture in electromagnetic contact with the reference wave.

13. The device of claim 11 , further comprising an antenna system that includes the aperture.

14. The device of claim 13 , wherein the antenna system further comprises:
a set of radiating elements coupled to the aperture,
wherein the aperture further comprises a set of aperture elements, and
wherein each aperture element corresponds to a radiating element.

15. The device of claim 10 , wherein the processor is further configured to select the antenna-plane pattern.

16. The device of claim 15 , wherein to select the antenna-plane pattern further comprises to receive the antenna-plane pattern from an external system.

17. The device of claim 15 , wherein to select the antenna-plane pattern further comprises:
define a two-dimensional far-field beam pattern; and
back-propagate the two-dimensional far-field beam pattern to an antenna plane.

18. The device of claim 15 , wherein to select the antenna-plane pattern further comprises to determine the antenna-plane pattern based on a selected projected beam pattern.

19. The device of claim 18 , wherein the processor is further configured to cause a set of radiating elements coupled to the aperture to emit a beam pattern based on the selected projected beam pattern.

20. The device of claim 10 , wherein the reference wave is propagating through a transmission line comprising a parallel-plate waveguide, a rectangular waveguide or a microstrip line.

21. The device of claim 10 , wherein the processor is configured to control an antenna system comprising a set of radiating elements coupled to the aperture.

22. The device of claim 21 , wherein the set of radiating elements further comprises metamaterial elements.

23. The device of claim 21 , wherein the set of radiating elements comprises sub-wavelength antenna elements, each configured to emit an electromagnetic emission in response to received electromagnetic energy, wherein each of the sub-wavelength antenna elements comprises at least one electromagnetically resonant element, and wherein a physical diameter of individual sub-wavelength antenna elements is less than an effective wavelength of the electromagnetic emission.

Assignees

• Elwha Llc

Inventors

• Black Eric J
• Deutsch Brian Mark
• Katko Alexander Remley
• Machado Melroy
• Mccandless Jay Howard
• Urzhumov Yaroslav A

Classifications

• H01Q3/44

  varying the electric or magnetic characteristics of reflecting, refracting, or diffracting devices associated with the radiating element · CPC title

• H01Q3/46 Primary

  Active lenses or reflecting arrays · CPC title

• H01Q15/0086

  said selective devices having materials with a synthesized negative refractive index, e.g. metamaterials or left-handed materials · CPC title