MRAM dry etching residue removal composition, method of producing magnetoresistive random access memory, and cobalt removal composition

Patent metadata

Field	Value
Publication number	US-10049883-B2
Application number	US-201715497224-A
Country	US
Kind code	B2
Filing date	Apr 26, 2017
Priority date	Oct 31, 2014
Publication date	Aug 14, 2018
Grant date	Aug 14, 2018

Abstract

An object is to provide an MRAM dry etching residue removal composition capable of removing dry etching residues while suppressing damage to a substrate containing a specific metal in a step of producing an MRAM, a method of producing a magnetoresistive random access memory using the same, and a cobalt removal composition having excellent cobalt removability. The MRAM dry etching residue removal composition of the present invention contains a strong oxidizing agent and water. In addition, the cobalt removal composition of the present invention contains orthoperiodic acid and water.

First claim

What is claimed is:

1. A method of producing a magnetoresistive random access memory comprising:
a step of dry etching a semiconductor substrate including a ferromagnetic layer containing CoFeB and/or CoFe and an insulator layer containing MgO; and
a step of removing dry etching residues with an MRAM dry etching residue removal composition,
wherein the MRAM dry etching residue removal composition comprises a strong oxidizing agent and water, the strong oxidizing agent being orthoperiodic acid (H 5 IO 6 ).

2. The method of producing a magnetoresistive random access memory according to claim 1 ,
wherein the dissolution rate of Co of the MRAM dry etching residue removal composition is 0.2 nm/min or greater.

3. The method of producing a magnetoresistive random access memory according to claim 1 ,
wherein in a case in which the dissolution rate of CoFeB of the MRAM dry etching residue removal composition is 0 nm/min or the dissolution rate of CoFeB of the MRAM dry etching residue removal composition is greater than 0 nm/min, a value of Co dissolution rate/CoFeB dissolution rate is 10 or greater.

4. The method of producing a magnetoresistive random access memory according to claim 1 ,
wherein the dissolution rate of MgO of the MRAM dry etching residue removal composition is 1 nm/min or less.

5. The method of producing a magnetoresistive random access memory according to claim 1 ,
wherein the content of the strong oxidizing agent of the MRAM dry etching residue removal composition is 0.01% to 5% by mass with respect to the total amount of the composition.

6. The method of producing a magnetoresistive random access memory according to claim 1 ,
wherein the pH of the MRAM dry etching residue removal composition is 9 or more.

7. The method of producing a magnetoresistive random access memory according to claim 1 , wherein the MRAM dry etching residue removal composition further comprises a pH adjusting agent.

8. The method of producing a magnetoresistive random access memory according to claim 7 ,
wherein the pH adjusting agent is selected from the group consisting of an organic amine compound and a quaternary ammonium hydroxide.

9. The method of producing a magnetoresistive random access memory according to claim 7 ,
wherein the content of the pH adjusting agent of the MRAM dry etching residue removal composition is 0.01% to 5% by mass with respect to the total amount of the composition.

10. The method of producing a magnetoresistive random access memory according to claim 1 ,
wherein the content of water of the MRAM dry etching residue removal composition is 30% by mass or more with respect to the total amount of the composition.

Assignees

• Fujifilm Corp

Inventors

• Park Keeyoung
• Mizutani Atsushi

Classifications

• H10P76/00

  Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography · CPC title

• H10P52/00 Primary

  Grinding, lapping or polishing of wafers, substrates or parts of devices · CPC title

• C11D3/26

  containing nitrogen {(C11D3/162, C11D3/164, C11D3/166, C11D3/168 take precedence)} · CPC title

• C11D3/30

  Amines; Substituted amines {; Quaternized amines} · CPC title

• C11D17/08

  Liquid soap, {e.g. for dispensers}; capsuled · CPC title