Molded chip package and method of manufacturing the same
US-9780061-B2 · Oct 3, 2017 · US
US10043782B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10043782-B2 |
| Application number | US-201715470960-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 28, 2017 |
| Priority date | Apr 4, 2016 |
| Publication date | Aug 7, 2018 |
| Grant date | Aug 7, 2018 |
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A method for fabricating an electronic device package includes providing a carrier, disposing a semiconductor chip onto the carrier, the semiconductor chip having a contact pad on a main face thereof remote from the carrier, applying a contact element onto the contact pad, applying a dielectric layer on the carrier, the semiconductor chip, and the contact element, and applying an encapsulant onto the dielectric layer.
Opening claim text (preview).
What is claimed is: 1. A method for fabricating an electronic device package, the method comprising: providing a carrier; disposing a semiconductor chip onto the carrier, the semiconductor chip comprising a contact pad on a main face of the semiconductor chip; applying a contact element onto the contact pad; applying a dielectric layer on the carrier, the semiconductor chip, and the contact element; and applying an encapsulant onto the dielectric layer. 2. The method of claim 1 , wherein the dielectric layer comprises one or more of a polymer layer, polyimide layer, a parylene layer, a polybenzoxazole layer, an epoxy resin layer, a silicone layer, a spin-on glass layer, a semiconductor oxide layer, a semiconductor nitride layer and a semiconductor oxynitride layer. 3. The method of claim 1 , wherein the dielectric layer comprises one or more of the following properties: a dielectric constant in a range from 2 to 5; a dielectric strength in a range from 100 V/μm to 500 V/μm; a dissipation factor in a range from 0.005 to 0.03; and a modulus of elasticity in a range from 0.1 to 5.0 GPa. 4. The method of claim 1 , wherein the dielectric layer is applied with a thickness in a range from 2 μm to 100 μm. 5. The method of claim 1 , wherein applying the dielectric layer comprises one or more of: spin coating; spray coating; jet coating; electrostatic coating and/or atomizing coating or ion atomizing; wave coating; potting; filling; laminating; dipping; physical vapor deposition; chemical vapor deposition; and printing. 6. The method of claim 1 , further comprising: heating or curing the deposited dielectric layer at a heating temperature in a range up to 500° C. and a heating time in a range up to 5 h. 7. The method of claim 1 , wherein applying the dielectric layer comprises: applying a stack of two or more dielectric layers of one or more of different materials or of different properties. 8. The method of 1 , wherein applying the dielectric layer comprises: depositing a first dielectric layer and treating the deposited first dielectric layer with a first set of conditions; and depositing a second dielectric layer and treating the deposited second dielectric layer with a second set of conditions different from the first set of conditions. 9. The method of claim 8 , wherein the first set of conditions comprises a first heating temperature and a first heating time, and wherein the second set of conditions comprises a second heating temperature and a second heating time. 10. The method of claim 1 , wherein applying the encapsulant comprises: applying a host material comprising one or more of a resin, an epoxy silicone, an epoxy polyimide, a bismaleimide, a cyanate ester, and a thermoplast. 11. The method of claim 1 , wherein applying the encapsulant comprises: applying a host material comprising filler increments embedded therein, the filler increments being made of SiO, Al2O3, ZnO, MgO, AlN, Si3N4, BN, a ceramic material, or a metallic material. 12. The method of claim 1 , wherein the encapsulant is applied by transfer molding, compression molding, vacuum casting, or laminating.
Encapsulations, e.g. protective coatings · CPC title
characterised by their shape or disposition · CPC title
Die-attach connectors and bond wires · CPC title
between a chip and a stacked insulating package substrate, interposer or RDL · CPC title
the connected ends being on auxiliary connecting means on bond pads, e.g. on other bond wires · CPC title
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