Oxide sputtering target, and thin film transistor using the same

US10032927B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10032927-B2
Application numberUS-201615374189-A
CountryUS
Kind codeB2
Filing dateDec 9, 2016
Priority dateMar 6, 2014
Publication dateJul 24, 2018
Grant dateJul 24, 2018

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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An oxide sputtering target includes at least one of indium (In), zinc (Zn), tin (Sn), and gallium (Ga), and tungsten (W) in an amount from 0.005 mol % to 1 mol %.

First claim

Opening claim text (preview).

What is claimed is: 1. An oxide sputtering target comprising: at least one of indium (In), zinc (Zn), tin (Sn), and gallium (Ga); and niobium (Nb) in an amount from 0.01 mol % to 1 mol %. 2. The oxide sputtering target of claim 1 , wherein an indium content is from 10 mol % to 60 mol %, a zinc content is from 10 mol % to 65 mol %, and a tin content is from 0.1 mol % to 60 mol %. 3. The oxide sputtering target of claim 1 , wherein the oxide sputtering target comprises indium (In). 4. The oxide sputtering target of claim 1 , wherein the oxide sputtering target comprises zinc (Zn). 5. The oxide sputtering target of claim 1 , wherein the oxide sputtering target comprises tin (Sn). 6. The oxide sputtering target of claim 1 , wherein the oxide sputtering target comprises gallium (Ga).

Assignees

Inventors

Classifications

  • Manufacturing of targets · CPC title

  • Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy · CPC title

  • Plural materials · CPC title

  • Electricity · mapped topic

  • Electricity · mapped topic

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Frequently asked questions

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What does patent US10032927B2 cover?
An oxide sputtering target includes at least one of indium (In), zinc (Zn), tin (Sn), and gallium (Ga), and tungsten (W) in an amount from 0.005 mol % to 1 mol %.
Who is the assignee on this patent?
Samsung Display Co Ltd
What technology area does this patent fall under?
Primary CPC classification H01J37/3429. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jul 24 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).