Copper alloy for electronic device, method for producing copper alloy for electronic device, and copper alloy rolled material for electronic device

US10032536B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10032536-B2
Application numberUS-201414291335-A
CountryUS
Kind codeB2
Filing dateMay 30, 2014
Priority dateMay 14, 2010
Publication dateJul 24, 2018
Grant dateJul 24, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

One aspect of this copper alloy for an electronic device is composed of a binary alloy of Cu and Mg which includes Mg at a content of 3.3 to 6.9 atomic %, with a remainder being Cu and inevitable impurities, and a conductivity σ (% IACS) is within the following range when the content of Mg is given as A atomic %, σ≤{1.7241/(−0.0347×A 2 +0.6569×A+1.7)}×100. Another aspect of this copper alloy is composed of a ternary alloy of Cu, Mg, and Zn which includes Mg at a content of 3.3 to 6.9 atomic % and Zn at a content of 0.1 to 10 atomic %, with a remainder being Cu and inevitable impurities, and a conductivity σ (% IACS) is within the following range when the content of Mg is given as A atomic % and the content of Zn is given as B atomic %, σ≤{1.7241/(X+Y+1.7)}×100, X=−0.0347×A 2 +0.6569×A and Y=−0.0041×B 2 +0.2503×B.

First claim

Opening claim text (preview).

The invention claimed is: 1. A copper alloy for an electronic device, wherein the copper alloy is composed of a ternary alloy of Cu, Mg, and Zn, the ternary alloy comprises Mg at a content in a range of 3.3 to 6.9 atomic % and Zn at a content in a range of 0.1 to 10 atomic %, with a remainder being Cu and inevitable impurities, a conductivity σ (% IACS) satisfies the following relation when the content of Mg is given as A atomic % and the content of Zn is given as B atomic %, σ≤{1.7241/( X′+Y′+ 1.7)}×100 X′=− 0.0292× A 2 +0.6797× A Y′=− 0.0038× B 2 +0.2488× B , and the copper alloy substantially consists of a Cu—Mg—Zn solid solution alloy supersaturated with Mg. 2. A rolled copper alloy for an electronic device, which is composed of the copper alloy for an electronic device according to claim 1 , wherein a Young's modulus E is in a range of 125 GPa or less, and a 0.2% proof stress σ 0.2 is in a range of 400 MPa or more. 3. The rolled copper alloy for an electronic device according to claim 2 , wherein the rolled copper alloy is used as a copper material that constitutes a terminal, a connector, or a relay.

Assignees

Inventors

Classifications

  • using master alloys · CPC title

  • by melting {(C22C1/1036 takes precedence)} · CPC title

  • of copper or alloys based thereon · CPC title

  • with zinc as the next major constituent · CPC title

  • H01B1/026Primary

    Alloys based on copper · CPC title

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What does patent US10032536B2 cover?
One aspect of this copper alloy for an electronic device is composed of a binary alloy of Cu and Mg which includes Mg at a content of 3.3 to 6.9 atomic %, with a remainder being Cu and inevitable impurities, and a conductivity σ (% IACS) is within the following range when the content of Mg is given as A atomic %, σ≤{1.7241/(−0.0347×A 2 +0.6569×A+1.7)}×100. Another aspect of this copper alloy is…
Who is the assignee on this patent?
Mitsubishi Materials Corp
What technology area does this patent fall under?
Primary CPC classification H01B1/026. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jul 24 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).