Film forming apparatus

US10030603B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10030603-B2
Application numberUS-201715713901-A
CountryUS
Kind codeB2
Filing dateSep 25, 2017
Priority dateSep 27, 2016
Publication dateJul 24, 2018
Grant dateJul 24, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The film forming apparatus includes a mask member and a shield member. The mask member is made of a cylindrical insulation material that can expose inner surfaces of cylinder bores, and mask the inner surface of a crankcase. The shield member is made of a metal material disposed along an inner surface of the mask member.

First claim

Opening claim text (preview).

What is claimed is: 1. A film forming apparatus configured to form a film on an inner surface of a cylindrical work, the film forming apparatus comprising: a mask member of a cylindrical shape made of an insulation material, and configured to expose a film formation portion of the inner surface of the work at which the film is formed, and mask a non-formation portion of the inner surface of the work at which the film is not formed; and a shield member disposed along an inner surface of the mask member and made of a metal material. 2. The film forming apparatus according to claim 1 , wherein: at least part of the mask member is in contact with the inner surface of the work; and the shield member is distant from the work. 3. The film forming apparatus according to claim 1 , wherein, when the work is a cylinder block, the mask member is configured to expose an inner surface of a cylinder bore of the cylinder block as the film formation portion, and mask an inner surface of a crankcase of the cylinder block as the non-formation portion. 4. The film forming apparatus according to claim 3 , further comprising: a source gas supply device configured to supply a source gas of the film to a cylinder of the cylinder block; a housing configured to house the cylinder block; a closing member disposed between the source gas supply device and the housing; a manifold connected to an exhaust unit configured to exhaust a gas in the cylinder; an anode case disposed between and electrically insulated from the housing and the manifold, and made of a conductive material; and an anode electrode disposed in and electrically insulated from the anode case, and configured to produce a potential difference from the cylinder block. 5. The film forming apparatus according to claim 4 , wherein: the shield member extends from an interior of the mask member to an interior of the anode case; and the shield member and the anode case are electrically insulated from each other.

Assignees

Inventors

Classifications

  • Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates · CPC title

  • using electric discharges {(generation and control of plasma in discharge tubes for surface treatment H01J37/32, H01J37/34)} · CPC title

  • using masks · CPC title

  • by etching with a plasma · CPC title

  • Coating on selected surface areas, e.g. using masks · CPC title

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Frequently asked questions

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What does patent US10030603B2 cover?
The film forming apparatus includes a mask member and a shield member. The mask member is made of a cylindrical insulation material that can expose inner surfaces of cylinder bores, and mask the inner surface of a crankcase. The shield member is made of a metal material disposed along an inner surface of the mask member.
Who is the assignee on this patent?
Honda Motor Co Ltd, Honda Motor Co Ltd
What technology area does this patent fall under?
Primary CPC classification C23C16/0245. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jul 24 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).