Monoaminosilane compounds

US10030038B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10030038-B2
Application numberUS-201515314323-A
CountryUS
Kind codeB2
Filing dateMay 29, 2015
Priority dateMay 30, 2014
Publication dateJul 24, 2018
Grant dateJul 24, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Disclosed is a compound of formula (I): (R1R2N)SinH2n+1 (I), wherein subscript n is an integer from 3 to 9; and each R1 and R2 independently is (C1-C6)alkyl, (C3-C6)cycloalkyl, (C2-C6)alkenyl, (C2-C6)alkynyl, or phenyl; or R1 is H and R2 is (C1-C6)alkyl, (C3-C6)cycloalkyl, (C2-C6)alkenyl, (C2-C6)alkynyl, or phenyl; or R1 and R2 are bonded together to be -R1a R2a wherein -R1a-R2a- is (C2-C6)alkylene. Also disclosed are a method of making, intermediates useful therein, method of using, and composition comprising the compound of formula (I).

First claim

Opening claim text (preview).

What is claimed is: 1. A compound of formula (I): (R 1 R 2 N)Si n H 2n+1   (I) wherein subscript n is 5 or an integer from 7 to 9; and each R 1 and R 2 independently is (C 1 -C 6 )alkyl, (C 3 -C 6 )cycloalkyl, (C 2 -C 6 )alkenyl, (C 2 -C 6 )alkynyl, or phenyl; or R 1 is H and R 2 is (C 1 -C 6 )alkyl, (C 3 -C 6 )cycloalkyl, (C 2 -C 6 )alkenyl, (C 2 -C 6 )alkynyl, or phenyl; or R 1 and R 2 are bonded together to be -R 1a -R 2a - wherein -R 1a -R 2a - is (C 2 -C 5 )alkylene, and wherein when n=5 the compound of formula (I) is according to formula (I-l) R 1 R 2 N—SiH 2 Si(SiH 3 ) 3 (I-l). 2. The compound of claim 1 wherein each R 1 and R 2 independently is (C 1 -C 6 )alkyl; or R 1 is (C 1 -C 6 )alkyl and R 2 is (C 3 -C 5 )alkyl; or R 1 is methyl or ethyl and R 2 is isopropyl, sec-butyl, iso-butyl, or tert-butyl; or each R 1 and R 2 independently is isopropyl, sec-butyl, iso-butyl, or tert-butyl; or R 1 is methyl and R 2 is tert-butyl; or each R 1 and R 2 independently is (C 3 -C 4 )alkyl; or each R 1 and R 2 is isopropyl. 3. The compound of claim 1 wherein R 1 and R 2 are bonded together to be -R 1a -R 2a - wherein -R 1a -R 2a - is (C 3 -C 5 )alkylene. 4. The compound of claim 1 comprising a compound of formula R 1 R 2 N—SiH 2 Si(SiH 3 ) 2 SiH 2 Si(SiH 3 ) 3 (I-m), wherein R 1 and R 2 are as defined in claim 1 . 5. The compound according to formula (I) of claim 1 that is 1-(diisopropylamino)-2,2-disilyltrisilane; or 1-(diisopropylamino)-2,2,4,4-tetrasilylpentasilane. 6. A composition comprising the compound of claim 1 and at least one additional ingredient that is different than the compound of any one of the preceding claims. 7. A method of making a compound of formula (I): (R 1 R 2 N)Si n H 2n+1   (I) wherein subscript n is an integer from 3 to 9; and each R 1 and R 2 independently is (C 1 -C 6 )alkyl, (C 3 -C 6 )cycloalkyl, (C 2 -C 6 )alkenyl, (C 2 -C 6 )alkynyl, or phenyl; or R 1 is H and R 2 is (C 1 -C 6 )alkyl, (C 3 -C 6 )cycloalkyl, (C 2 -C 6 )alkenyl, (C 2 -C 6 )alkynyl, or phenyl; or R 1 and R 2 are bonded together to be -R 1a -R 2a - wherein -R 1a -R 2a - is (C 2 -C 5 )alkylene, the method comprising: Contacting a compound of formula (c1): (R 1 R 2 N)Si n X 2n+1 (c1), wherein each X independently is a halogen atom selected from Cl, Br, and I; and n, R 1 and R 2 are as defined above, with an aluminum hydride to give a mixture of the compound of formula (I) and at least one reaction by-product. 8. A method of making a silicon-containing material, the method comprising subjecting a source gas comprising the compound of claim 1 to silicon deposition conditions in the presence of a substrate, to give a silicon-containing material formed on the substrate. 9. A method of making a compound of formula (I): (R 1 R 2 N)Si n H 2n+1   (I) wherein subscript n is an integer from 3 to 9; and each R 1 and R 2 independently is (C 1 -C 6 )alkyl, (C 3 -C 6 )cycloalkyl, (C 2 -C 6 )alkenyl, (C 2 -C 6 )alkynyl, or phenyl; or R 1 is H and R 2 is (C 1 -C 6 )alkyl, (C 3 -C 6 )cycloalkyl, (C 2 -C 6 )alkenyl, (C 2 -C 6 )alkynyl, or phenyl; or R 1 and R 2 are bonded together to be -R 1a -R 2a - wherein -R 1a -R 2a - is (C 2 -C 5 )alkylene, the method comprising: contacting a compound of formula (d1): R 1 R 2 NH (d1) with a compound of formula (d2) Si n H 2(n+1) (d2), wherein n, R 1 and R 2 are as defined above, in the presence of a catalyst, wherein the catalyst comprises at least one the main group elements Li, Na, K, Rb, Cs, Be, Mg, Ca, Sr, Ba, B, Al, Ga, In, TI, C, Si, Ge, Sn, Pb, N, P, As, Bb, Bi, O, S, Se, Te, F, Cl, Br, I, An, Cd, or Hg to give a reaction mixture; maintaining the reaction mixture at a temperature between about 0° C. to about 250° C.; allowing the reaction to proceed to form the compound of formula (I) above; separating the compound of formula (I) of the compound of formula (I) from the reaction mixture; wherein the reaction mixture temperature may vary during the synthesis and is maintained such that the temperature of the reaction mixture is not allowed to drop below about 0° C. and not exceed about 250° C. 10. The method of claim 9 , wherein the catalyst comprises at least one of the elements Mg, Ca, Sr, Ba, B, Al, Ga, Ge or Sn.

Assignees

Inventors

Classifications

  • C07F7/10Primary

    containing nitrogen {having a Si-N linkage} · CPC title

  • by reactions involving the formation of Si-Y linkages, where Y is not a carbon or halogen atom · CPC title

  • Organo silicon halides · CPC title

  • from metallo-organic compounds · CPC title

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What does patent US10030038B2 cover?
Disclosed is a compound of formula (I): (R1R2N)SinH2n+1 (I), wherein subscript n is an integer from 3 to 9; and each R1 and R2 independently is (C1-C6)alkyl, (C3-C6)cycloalkyl, (C2-C6)alkenyl, (C2-C6)alkynyl, or phenyl; or R1 is H and R2 is (C1-C6)alkyl, (C3-C6)cycloalkyl, (C2-C6)alkenyl, (C2-C6)alkynyl, or phenyl; or R1 and R2 are bonded together to be -R1a R2a wherein -R1a-R2a- is (C2-C6)alky…
Who is the assignee on this patent?
Dow Corning, Dow Silicones Corp
What technology area does this patent fall under?
Primary CPC classification C07F7/10. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jul 24 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).