Latex composition for dip-forming including carboxylic acid modified-nitrile based copolymer latex and dip-formed article prepared therefrom

US10023728B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10023728-B2
Application numberUS-201515507940-A
CountryUS
Kind codeB2
Filing dateOct 20, 2015
Priority dateOct 20, 2014
Publication dateJul 17, 2018
Grant dateJul 17, 2018

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

The present invention relates to a latex composition for dip-forming including two different types of carboxylic acid modified-nitrile based copolymer latex, and a dip-formed article prepared therefrom having excellent durability for sweat, and having high tensile strength and elongation percentage. Accordingly, the latex composition for dip-forming has excellent tensile strength, elongation percentage, stress and durability, and is useful in industries requiring these, for example, a rubber glove industry and the like.

First claim

Opening claim text (preview).

What is claimed is: 1. A latex composition for dip-forming comprising: a) carboxylic acid modified-nitrile based copolymer latex having a glass transition temperature of −30° C. to −5° C. and an average particle diameter of 100 nm to 200 nm, and including a reactive compound; and b) carboxylic acid modified-nitrile based copolymer latex having a glass transition temperature of −30° C. to −15° C. and an average particle diameter of 100 nm to 200 nm, wherein the reactive compound is not included, wherein the composition includes the a) carboxylic acid modified-nitrile based copolymer latex and the b) carboxylic acid modified-nitrile based copolymer latex in a weight ratio of 3:7 to 8:2, and wherein the reactive compound is a compound having one or more types of reactive groups selected from the group consisting of a vinyl group, an epoxy group and a glycidyl group. 2. The latex composition for dip-forming of claim 1 , wherein the a) carboxylic acid modified-nitrile based copolymer latex includes 0.1 parts by weight to 5 parts by weight of the reactive compound with respect to 100 parts by weight of a monomer mixture, and the monomer mixture includes 40% by weight to 89% by weight of a conjugated diene-based monomer; 10% by weight to 50% by weight of an ethylenically unsaturated nitrile-based monomer; and 0.1% by weight to 10% by weight of an ethylenically unsaturated acid monomer, and wherein the b) carboxylic acid modified-nitrile based copolymer latex includes 40% by weight to 89% by weight of a conjugated diene-based monomer; 10% by weight to 50% by weight of an ethylenically unsaturated nitrile-based monomer; and 0.1% by weight to 10% by weight of an ethylenically unsaturated acid monomer. 3. The latex composition for dip-forming of claim 2 , wherein the reactive compound is one or more types selected from the group consisting of a poly(tetramethylene ether)glycol diglycidyl ether compound, a 3-alkoxy-2-hydroxypropyl acrylate compound having 12 to 13 carbon atoms and a propylene glycol polybutyrene glycol monoacrylate compound. 4. The latex composition for dip-forming of claim 2 , wherein the reactive compound has a weight average molecular weight of 250 to 1000. 5. The latex composition for dip-forming of claim 2 , wherein the conjugated diene-based monomer is one or more types selected from the group consisting of 1,3-butadiene, 2,3-dimethyl-1,3-butadiene, 2-ethyl-1,3-butadiene, 1,3-pentadiene and isoprene. 6. The latex composition for dip-forming of claim 2 , wherein the ethylenically unsaturated nitrile-based monomer is one or more types selected from the group consisting of acrylonitrile, methacrylonitrile, fumaronitrile, α-chloronitrile and α-cyanoethyl acrylonitrile. 7. The latex composition for dip-forming of claim 2 , wherein the ethylenically unsaturated acid monomer is an ethylenically unsaturated monomer having a carboxyl group, a sulfonic acid group or an acid anhydride group. 8. The latex composition for dip-forming of claim 2 , wherein the ethylenically unsaturated acid monomer is one or more types selected from the group consisting of acrylic acid, methacrylic acid, itaconic acid, maleic acid, fumaric acid, maleic anhydride, citraconic anhydride, styrenesulfonic acid, monobutyl fumarate, monobutyl maleate and mono-2-hydroxypropyl maleate. 9. The latex composition for dip-forming of claim 2 , wherein the a) carboxylic acid modified-nitrile based copolymer latex and the b) carboxylic acid modified-nitrile based copolymer latex each further includes 0.1% by weight to 20% by weight of an ethylenically unsaturated monomer. 10. The latex composition for dip-forming of claim 9 , wherein the ethylenically unsaturated monomer is one or more types selected from the group consisting of styrene, alkyl styrene, vinyl naphthalene, fluoroethyl vinyl ether, (meth)acrylamide, N-methylol (meth)acrylamide, N,N-dimethylol (meth)acrylamide, N-methoxymethyl (meth)acrylamide, N-propoxymethyl (meth)acrylamide, vinyl pyridine, vinyl norbornene, dicyclopentadiene, 1,4-hexadiene, methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, trifluoroethyl (meth)acrylate, tetrafluoropropyl (meth)acrylate, dibutyl maleate, dibutyl fumarate, diethyl maleate, methoxymethyl (meth)acrylate, ethoxyethyl (meth)acrylate, methoxyethoxyethyl (meth)acrylate, cyanomethyl (meth)acrylate, 2-cyanoethyl (meth)acrylate, 1-cyanopropyl (meth)acrylate, 2-ethyl-6-cyanohexyl (meth)acrylate, 3-cyanopropyl (meth)acrylate, hydroxyethyl (meth)acrylate, hydroxyethyl (meth)acrylate, hydroxypropyl (meth)acrylate, glycidyl (meth)acrylate and dimethylaminoethyl (meth)acrylate. 11. The latex composition for dip-forming of claim 1 comprising the a) carboxylic acid modified-nitrile based copolymer latex and the b) carboxylic acid modified-nitrile based copolymer latex in 80% by weight to 99% by weight with respect to a total weight of the composition, and a solid concentration of 10% to 40% by weight with respect to the total weight of the composition. 12. The latex composition for dip-forming of claim 1 , which has a pH of 8 to 12. 13. A dip-formed article prepared from the latex composition for dip-forming of claim 1 . 14. The dip-formed article of claim 13 , which has nitrogen content of 6.69% by weight to 8.94% by weight based on a total weight of the dip-formed article. 15. The dip-formed article of claim 13 , which is one or more types of molded articles selected from the group consisting of an examination glove, a condom, a catheter, an industrial glove, a household glove and a health care product.

Assignees

Inventors

Classifications

  • C08L13/02Primary

    Latex · CPC title

  • grafted on to rubbers · CPC title

  • C08L9/04Primary

    Latex · CPC title

  • Hydrogenated nitrile rubber · CPC title

  • with carboxylic acids, sulfonic acids or salts thereof · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10023728B2 cover?
The present invention relates to a latex composition for dip-forming including two different types of carboxylic acid modified-nitrile based copolymer latex, and a dip-formed article prepared therefrom having excellent durability for sweat, and having high tensile strength and elongation percentage. Accordingly, the latex composition for dip-forming has excellent tensile strength, elongation pe…
Who is the assignee on this patent?
Lg Chemical Ltd
What technology area does this patent fall under?
Primary CPC classification C08L13/02. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jul 17 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).