System and method for treating water systems with high voltage discharge and ozone

US10023478B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10023478-B2
Application numberUS-201815883762-A
CountryUS
Kind codeB2
Filing dateJan 30, 2018
Priority dateMay 1, 2013
Publication dateJul 17, 2018
Grant dateJul 17, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A system and method for treating flowing water systems with a plasma discharge to remove or control growth of microbiological species. Components of the water system are protected from being damaged by excess energy from the electrohydraulic treatment. Ozone gas generated by a high voltage generator that powers the plasma discharge is recycled to further treat the water. A gas infusion system may be used to create fine bubbles of ozone, air, or other gases in the water being treated to aid in plasma generation, particularly when the conductivity of the water is high. An electrode mounting assembly maintains a high voltage electrode and ground electrode at a fixed distance from each other to optimize plasma generation. An open support structure for the high voltage generator circuit physically separates spark gap electrodes and resists metal deposits that may disrupt discharge of a high voltage pulse to create the plasma.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of treating a flowing water stream, the method comprising: generating a high voltage pulse and ozone using a Marx ladder circuit comprising a plurality of capacitors, resistors, and spark gap switches, wherein the spark gap switches are supported by an open support structure; supplying the high voltage pulse to a high voltage electrode disposed near a ground electrode, wherein both the high voltage electrode and ground electrode are at least partially disposed in water from the flowing water stream; generating a plasma discharge in the water near the electrodes; and one or more of the following steps: (a) contacting at least a portion of the support structure with oil to reduce metal deposits on the support structure; (b) supplying ozone to the flowing water stream; or (c) operating the Marx ladder circuit at a pressure less than one atmosphere. 2. The method of claim 1 further comprising the step of periodically cleaning the support structure to remove the oil and supplying fresh oil to contact at least a portion of the support structure. 3. The method of claim 1 wherein each spark gap switch comprises a pair of electrodes separated by a gap distance and wherein the open support structure is configured to support the plurality of spark gap switches so that the gap distance is between about 15 mm and 40 mm. 4. The method of claim 1 further comprising adding bubbles of the ozone or one or more other gases or both into the flowing water stream in an area where the plasma discharge occurs or upstream of where the plasma discharge occurs. 5. The method of claim 4 further comprising: measuring the conductivity of the flowing water stream; and initiating the adding bubbles step or increasing an amount of bubbles added when the conductivity is above a predetermined threshold. 6. The method of claim 1 further comprising: measuring the conductivity of the flowing water stream; adjusting one or more operating parameters when the conductivity is above a predetermined threshold; and wherein the one or more operating parameters are adjusted by one or more of the following steps: (1) moving the high voltage electrode and the ground electrode closer together; (2) increasing a voltage of the high voltage pulse supplied to the high voltage electrode; (3) increasing a rate of adding bubbles into the flowing water stream; or (4) wherein the plasma is generated in a reaction chamber having an inlet and an outlet, both in fluid communication with flowing water stream and reducing the pressure of the flowing water stream at the outlet of the reaction chamber. 7. The method of claim 3 further comprising adjusting a voltage of the high voltage pulse by increasing or decreasing the gap distance. 8. The method of claim 7 wherein the open support structure comprises a frame, plurality of posts supported by the frame, and a plurality of electrode mounts supported by the posts, wherein each electrode mount supports one of the spark gap electrodes; and wherein the gap distance is increased or decreased by laterally moving the spark gap electrodes relative to the electrode mounts or laterally moving the electrode mounts relative to the posts. 9. The method of claim 1 wherein the Marx ladder is contained in a housing, the method further comprising pumping or suctioning air through the housing. 10. The method of claim 1 wherein the flowing water stream is at least a portion of water flowing through a cooling tower or boiler system.

Assignees

Inventors

Classifications

  • Reducing the size of particles, liquid droplets or bubbles, e.g. by crushing, grinding, spraying, creation of microbubbles or nanobubbles · CPC title

  • Diffusers or nozzles for ozonation · CPC title

  • C02F1/4672Primary

    by electrooxydation · CPC title

  • Electrical pulses · CPC title

  • Details relating to the electrolytic devices · CPC title

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What does patent US10023478B2 cover?
A system and method for treating flowing water systems with a plasma discharge to remove or control growth of microbiological species. Components of the water system are protected from being damaged by excess energy from the electrohydraulic treatment. Ozone gas generated by a high voltage generator that powers the plasma discharge is recycled to further treat the water. A gas infusion system m…
Who is the assignee on this patent?
Nch Corp
What technology area does this patent fall under?
Primary CPC classification C02F1/4672. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jul 17 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).