Systems and methods for microwave-radiation annealing

Patent metadata

Field	Value
Publication number	US-10020210-B2
Application number	US-201615140609-A
Country	US
Kind code	B2
Filing date	Apr 28, 2016
Priority date	Jan 17, 2014
Publication date	Jul 10, 2018
Grant date	Jul 10, 2018

Abstract

Systems and methods are provided for annealing a semiconductor structure using microwave radiation. A semiconductor structure is provided. One or more energy-converting materials capable of increasing the semiconductor structure's absorption of microwave radiation are provided. Microwave radiation is applied to the energy-converting materials and the semiconductor structure to anneal the semiconductor structure for fabricating semiconductor devices. First local temperatures associated with one or more first zones of the semiconductor structure are detected. The microwave radiation applied to the energy-converting materials and the semiconductor structure is adjusted based at least in part on the detected first local temperatures.

First claim

What is claimed is:

1. A system for annealing a semiconductor structure using microwave radiation, the semiconductor structure including a top portion and a bottom portion, the system comprising:
one or more energy-converting materials capable of increasing a semiconductor structure's absorption of microwave radiation;
a controller configured to apply microwave radiation to the energy-converting materials and the semiconductor structure to anneal the semiconductor structure for fabricating semiconductor devices; and
one or more thermal detectors configured to (i) detect first local temperatures associated with one or more first zones of the semiconductor structure, the one or more first zones being disposed in a top portion of the semiconductor structure, and (ii) detect second local temperatures associated with one or more second zones of the semiconductor structure, the one or more second zones being disposed in a bottom portion of the semiconductor structure, and
wherein the controller is further configured to adjust the microwave radiation applied to the energy-converting materials and the semiconductor structure based at least in part on the first local temperatures and the second local temperatures that are detected by the one or more thermal detectors, wherein the controller is further configured to maintain an ambient control flow including less than 10 ppm oxygen.

2. The system of claim 1 , wherein the thermal detectors include one or more pyrometers.

3. The system of claim 1 , wherein the thermal detectors are disposed at different angles for detecting the first and second local temperatures.

4. The system of claim 1 , further comprising: a microwave-radiation source including a magnetron, a traveling-wave-tube amplifier, a gyrotron, or a klystron tube source.

5. The system of claim 1 , wherein the energy-converting materials include n-type doped silicon, hot-pressed silicon carbide, aluminum-coated silicon carbide, silicon-carbide-coated graphite, silicon phosphide, titanium, nickel, silicon nitride, or silicon dioxide.

6. The system of claim 1 , wherein the thermal detectors are disposed within the energy-converting materials.

7. The system of claim 1 , wherein the energy-converting materials comprise a first energy-converting material disposed above the semiconductor structure and a second energy-converting material disposed below the semiconductor structure.

8. The system of claim 1 , wherein the energy-converting materials are formed on the semiconductor structure.

9. The system of claim 1 , wherein the one or more energy-converting materials includes a first energy converting material layer,
wherein the one or more thermal detectors includes a first thermal detector and a second thermal detector,
wherein the first thermal detector is disposed over the first energy converting material layer and the second thermal detector extends completely through the first energy converting material layer, and
wherein the first energy converting material layer is disposed over the semiconductor structure such that the first energy converting material layer is disposed between the first thermal detector and the semiconductor structure.

10. A system for annealing a semiconductor structure using microwave radiation, the system comprising:
one or more data processors; and
a non-transitory computer-readable medium containing computer instructions stored therein for commanding the one or more data processors to perform operations including:
applying microwave radiation to one or more energy-converting materials and a semiconductor structure to anneal the semiconductor structure for fabricating semiconductor devices, the one or more energy-converting materials being capable of increasing the semiconductor structure's absorption of the microwave radiation, wherein the one or more energy-converting materials are spaced apart from the semiconductor structure;
detecting first local temperatures associated with one or more first zones of the semiconductor structure;
detecting second local temperatures associated with one or more second zones of the semiconductor structure; and
adjusting the microwave radiation applied to the energy-converting materials and the semiconductor structure based at least in part on the detected first and second local temperatures.

11. The system of claim 10 , wherein the one or more first zones are disposed in a top portion of the semiconductor structure, and the one or more second zones are disposed in a bottom portion of the semiconductor structure.

12. The system of claim 10 , wherein the thermal detectors are disposed at different angles for detecting the first and second local temperatures.

13. The system of claim 10 , wherein the one or more processors are further configured to maintain an ambient control flow including less than 10 ppm oxygen.

14. The system of claim 10 , wherein the energy-converting materials comprise a first energy-converting material disposed above the semiconductor structure and a second energy-converting material disposed below the semiconductor structure.

15. The system of claim 10 , wherein the energy-converting materials are disposed on the semiconductor structure.

16. A method for annealing a semiconductor structure using microwave radiation, the method comprising:
applying microwave radiation to one or more energy-converting materials and a semiconductor structure using a controller, the one or more energy-converting materials being capable of increasing the semiconductor structure's absorption of microwave radiation;
detecting first local temperatures associated with one or more first zones of the semiconductor structure using one or more thermal detectors, the one or more first zones being disposed in a top portion of the semiconductor structure;
detecting second local temperatures associated with one or more second zones of the semiconductor structure using the one or more thermal detectors, the one or more second zones being disposed in a bottom portion of the semiconductor structure; and
adjusting the microwave radiation applied to the one or more energy-converting materials and the semiconductor structure using the controller, wherein the microwave radiation is adjusted based at least in part on the first local temperatures and the second local temperatures that are detected by the one or more thermal detectors, wherein at least one of the one or more thermal detectors extends completely through at least one of the one or more energy-converting materials.

17. The method of claim 16 , wherein the microwave radiation is adjusted to keep the first and second local temperatures within respective targeted ranges.

18. The method of claim 16 , wherein the controller is further configured to maintain an ambient control flow including less than 10 ppm oxygen.

19. The method of claim 16 , wherein the one or more energy-converting materials comprise a first energy-converting material disposed above the semiconductor structure and a second energy-converting material disposed below the semiconductor structure.

20. The method of claim 16 , wherein the microwave radiation has a frequency within a range of approximately 2 GHz to approximately 10 GHz.

Assignees

• Taiwan Semiconductor Mfg Co Ltd

Inventors

• Tsai Chun-Hsiung
• Fang Zi-Wei
• Wang Chao-Hsiung

Classifications

• H10P95/90 Primary

  Thermal treatments, e.g. annealing or sintering · CPC title

• H10P74/23

  characterised by multiple measurements, corrections, marking or sorting processes · CPC title

• H10P72/0602

  Temperature monitoring · CPC title

• H10P34/422

  using incoherent radiation · CPC title

• H10P72/0436 Primary

  mainly by radiation · CPC title