Method for reducing porogen accumulation from a UV-cure chamber

Patent metadata

Field	Value
Publication number	US-10020197-B2
Application number	US-201514717806-A
Country	US
Kind code	B2
Filing date	May 20, 2015
Priority date	Dec 5, 2005
Publication date	Jul 10, 2018
Grant date	Jul 10, 2018

Abstract

Porogen accumulation in a UV-cure chamber is reduced by removing outgassed porogen through a heated outlet while purge gas is flowed across a window through which a wafer is exposed to UV light. A purge ring having specific major and minor exhaust to inlet area ratios may be partially made of flame polished quartz to improve flow dynamics. The reduction in porogen accumulation allows more wafers to be processed between chamber cleans, thus improving throughput and cost.

First claim

What is claimed is:

1. A method to remove outgassed porogens from a UV chamber, the method comprising:
providing a purge ring having an inlet portion and an outlet portion;
heating the outlet portion; and
flowing an inert gas from the inlet portion across an underside of a window to the heated outlet portion.

2. The method of claim 1 , wherein the outlet portion is heated to at least 100° C.

3. The method of claim 1 , wherein the outlet portion has an outlet with a major outlet surface area and the inlet portion has an inlet with a major inlet surface area and the ratio of the major outlet surface area to the major inlet surface area is greater than about 4:1.

4. The method of claim 3 , wherein the inlet portion is angled so as to direct the inert gas towards the window at an oblique angle.

5. The method of claim 1 , wherein the outlet portion has an outlet with a minor outlet surface area and the inlet portion has an inlet with a minor inlet surface area and the ratio of the minor outlet surface area to the minor inlet surface area is greater than about 2:1.

6. The method of claim 1 , wherein the purge gas residence time within the UV chamber is less than about 125 seconds.

7. The method of claim 1 , further comprising flowing oxygen plasma into the UV chamber.

8. The method of claim 1 , further comprising flowing oxygen across the window from the inlet portion to the outlet portion while irradiating the oxygen with a UV lamp to form an ozone cleaning gas.

9. The method of claim 1 , further comprising flowing remotely generated ozone into the UV chamber.

10. The method of claim 1 , wherein:
the inlet portion extends around 50% to 75% or more of an interior diameter of the purge ring, and
the outlet portion extends around 50% to 25% or less of the interior diameter of the purge ring.

11. The method of claim 10 , wherein the inlet portion includes an inlet that spans 75% or more of the interior diameter of the purge ring.

12. The method of claim 10 , wherein the inlet portion is angled so as to direct the inert gas towards the window at an oblique angle.

13. The method of claim 1 , wherein:
the inlet portion has a major inlet surface area defined by one or more reference surfaces that are perpendicular to a wafer support of the UV chamber and through which the inert gas passes when the inert gas passes from the inlet portion of the purge ring into the UV chamber,
the outlet portion has a major outlet surface area defined by one or more reference surfaces that are perpendicular to the wafer support and through which the inert gas passes when the inert gas passes from the UV chamber into the outlet portion of the purge ring, and
the ratio of the major outlet surface area to the major inlet surface area is greater than 4:1.

14. The method of claim 1 , wherein:
the inlet portion has a minor inlet surface area at a connection of the purge ring with a gas delivery system,
the minor inlet surface area is the cross-sectional area of the inlet portion at the connection of the purge ring with the gas delivery system,
the outlet portion has a minor outlet surface area at a connection of the purge ring with an exhaust system,
the minor outlet surface area is the cross-sectional area of the outlet portion at the connection of the purge ring with the exhaust system, and
the ratio of the minor outlet surface area to the minor inlet surface area is greater than about 2:1.

15. The method of claim 1 , further comprising:
a) placing a semiconductor wafer into the UV chamber;
b) exposing the semiconductor wafer to UV radiation through the window while the inert gas is flowed from the inlet portion across the underside of the window to the heated outlet portion;
c) removing the semiconductor wafer from the UV chamber; and
d) performing (a) through (c) for one or more additional semiconductor wafers.

16. The method of claim 15 , further comprising:
flowing, after (c) and before a subsequent performance of (a), one or more cleaning gases from the inlet portion of the purge ring to the outlet portion of the purge ring; and
removing, with the one or more cleaning gases, porogens that have outgassed from the semiconductor wafers exposed to UV radiation in (b) and have deposited on the window.

17. The method of claim 15 , wherein the outlet portion is heated to 100° C. or more before exposing the semiconductor wafer to UV radiation in (b).

18. The method of claim 16 , wherein the flowing of the one or more cleaning gases includes flowing a remotely-generated plasma from the inlet portion to the outlet portion and then flowing oxygen from the inlet portion to the outlet portion while exposing the oxygen to UV radiation through the window.

19. The method of claim 16 , wherein the one or more cleaning gases comprises oxygen.

20. The method of claim 19 , wherein the one or more cleaning gases are flowed from the inlet portion of the purge ring to the outlet portion of the purge ring while UV radiation is provided through the window.

Assignees

• Novellus Systems Inc

Inventors

• Gytri Lisa
• Gordon Jeff
• Lee James
• Balderrama Carmen
• Harris Joseph Brett
• Smargiassi Eugene
• Lau Stephen Yu-Hong
• Kamian George D
• Xi Ming

Classifications

• H10P72/0436

  mainly by radiation · CPC title

• H10P72/0402 Primary

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H10P70/00

  Cleaning of wafers, substrates or parts of devices · CPC title

• H10P34/00

  Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices · CPC title

• H10P14/6538

  by exposure to UV light · CPC title