Miniature differential pressure flow sensor

US10018489B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10018489-B2
Application numberUS-201615198000-A
CountryUS
Kind codeB2
Filing dateJun 30, 2016
Priority dateJun 30, 2015
Publication dateJul 10, 2018
Grant dateJul 10, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A fluid flow velocity sensor using a differential pressure measurement includes a stack having a tip pointing in a first direction, the stack including first and second plates arranged in parallel one another along the first direction; and a pressure-sensitive diaphragm arranged between the first and second plates along the first direction, the pressure-sensitive diaphragm being spaced apart from the first plate by a first cavity and from the second plate by a second cavity. The first cavity is entirely sealed, except at the tip of the stack, so as to be under a stagnation pressure during operation of the fluid flow velocity sensor. The second cavity is opened so as to be under a reference pressure during operation of the fluid flow velocity sensor. The fluid flow velocity sensor includes a detector to measure a parameter representative of the differential pressure between the first and the second cavities.

First claim

Opening claim text (preview).

The invention claimed is: 1. A fluid flow velocity sensor using a differential pressure measurement and comprising: a stack having a tip pointing in a first direction, said stack comprising: first and second plates arranged in parallel one another along the first direction; and a pressure-sensitive diaphragm arranged between the first and second plates along the first direction, said pressure-sensitive diaphragm being spaced apart from the first plate by a first cavity and from the second plate by a second cavity; wherein the first cavity is entirely sealed, except at the tip of the stack, so as to be under a stagnation pressure during operation of the fluid flow velocity sensor, and wherein the second cavity is opened so as to be under a reference pressure during operation of the fluid flow velocity sensor; wherein said pressure-sensitive diaphragm extends up to the tip of the stack, where the stagnation pressure is sensed; and a detector configured to measure a parameter representative of the differential pressure between the first and the second cavities. 2. The fluid flow velocity sensor according to claim 1 , wherein the stack has at least two leading edges extending from the tip and a trailing edge, wherein the first cavity is sealed along said at least two leading edges and trailing edge of the stack, and wherein the second cavity is sealed at the tip and along the leading edges of the stack. 3. The fluid flow velocity sensor according to claim 2 , wherein the first plate, the second plate and the pressure-sensitive diaphragm have a triangular shape, and wherein the trailing edge connects the two leading edges of the stack. 4. The fluid flow velocity sensor according to claim 2 , wherein the stack comprises: a triangular nose delimited by the two leading edges; a rectangular body extending the nose in the first direction and delimited by two longitudinal edges and the trailing edge, the trailing edge connecting the two longitudinal edges. 5. The fluid flow velocity sensor according to claim 4 , further comprising: a capillary sleeve surrounding the nose and a part of the body of the stack and having a flow inlet in front of the tip of the stack; and a sealing material filling a dead volume between the capillary sleeve and the stack. 6. The fluid flow velocity sensor according to claim 2 , wherein the second cavity is opened along the trailing edge of the stack. 7. The fluid flow velocity sensor according to claim 1 , wherein the second cavity is opened through a static pressure hole formed in the second plate. 8. The fluid flow velocity sensor according to claim 1 , wherein the first and second plates have an electrically conductive inner surface and wherein the pressure-sensitive diaphragm is electrically conducting, the detector comprising an electronic circuit for measuring a capacitance variation of the stack. 9. The fluid flow velocity sensor according to claim 8 , wherein the first and second plates are made of stainless steel and the pressure-sensitive diaphragm is made of brass. 10. The fluid flow velocity sensor according to claim 8 , wherein the circuit for measuring the capacitance variation of the stack comprises a dual coil transformer configured to apply excitation signals of opposite phases on the first and second plates, and two preamplifier sensing a resulting electric potential of the pressure-sensitive diaphragm and having cross-correlated outputs. 11. The fluid flow velocity sensor according to claim 1 , wherein the pressure-sensitive diaphragm comprises a thin-film strain gauge and the detector comprising an electronic circuit for measuring a resistance variation of the thin-film strain gauge. 12. The fluid flow velocity sensor according to claim 11 , wherein the pressure-sensitive diaphragm comprises a polyimide film coated with a metallic resistive pattern and wherein the first and second plates are made of an aluminum alloy. 13. The fluid flow velocity sensor according to claim 11 , wherein the electronic circuit measuring the resistance variation of the thin-film strain gauge comprises a Wheatstone bridge, the metallic resistive pattern forming one resistor of the Wheatstone bridge, and two preamplifier sensing an output voltage of the Wheatstone bridge and having cross-correlated outputs. 14. The fluid flow velocity sensor according to claim 1 , wherein, the pressure-sensitive diaphragm and the inner surfaces of the first and second plates are hydrophobic. 15. The fluid flow velocity sensor according to claim 1 , wherein the first and second plates have grooves on their inner surface, extending from the tip of the stack along the first and second plates in the first direction. 16. The fluid flow velocity sensor according to claim 1 , wherein the pressure-sensitive diaphragm has substantially the same area as the first and second plates. 17. A method for manufacturing a fluid flow velocity sensor, comprising: forming a stack successively comprising a first plate, a first sacrificial layer, a pressure-sensitive diaphragm, a second sacrificial layer and a second plate arranged in parallel to each other along a first direction, said stack having a tip pointing in the first direction, at least two leading edges extending from the tip and a trailing edge, said pressure-sensitive diaphragm extending up to the tip of the stack; forming first and second tight seal along the two leading edges of the stack while keeping opened the tip of the stack between the pressure-sensitive diaphragm and the first plate; removing the first and second sacrificial layers through the trailing edge of the stack; and forming a third tight seal along the trailing edge of the stack between the pressure-sensitive diaphragm and the first plate. 18. The method according to claim 17 , wherein the first and second sacrificial layers are made of PTFE. 19. The method according to claim 17 , wherein the first and second sacrificial layers are first and second resin layers deposited on an inner surface of the first and second plates respectively.

Assignees

Inventors

Classifications

  • G01F1/383Primary

    with electrical or electro-mechanical indication · CPC title

  • Arrangements or constructions of Pitot tubes · CPC title

  • Pitot tubes · CPC title

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What does patent US10018489B2 cover?
A fluid flow velocity sensor using a differential pressure measurement includes a stack having a tip pointing in a first direction, the stack including first and second plates arranged in parallel one another along the first direction; and a pressure-sensitive diaphragm arranged between the first and second plates along the first direction, the pressure-sensitive diaphragm being spaced apart fr…
Who is the assignee on this patent?
Commissariat Energie Atomique, Commissariat Energie Atomique
What technology area does this patent fall under?
Primary CPC classification G01F1/383. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jul 10 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).