Device manufacturing method and device manufacturing apparatus

Patent metadata

Field	Value
Publication number	US-10002801-B2
Application number	US-201715597285-A
Country	US
Kind code	B2
Filing date	May 17, 2017
Priority date	Jun 29, 2016
Publication date	Jun 19, 2018
Grant date	Jun 19, 2018

Abstract

The device manufacturing method includes a length measuring step (S 5 ) of, on the basis of an observation target image of an SEM image taken from a direction having a predetermined angle from a direction perpendicular to a plane of a substrate, measuring the thickness of a target object, or the depth of etching, formed on the substrate. In addition, in the length measuring step, an etching angle made by a cross section of the etching and the direction perpendicular to the plane of the substrate is calculated from processing data of the target object, and the thickness of the target object or the depth of the etching is measured on the basis of the calculated etching angle.

First claim

What is claimed is:

1. A device manufacturing method comprising
a length measuring step of, on the basis of an observation target image of a Scanning Electron Microscope (SEM) image taken from a direction having a predetermined angle from a direction perpendicular to a plane of a substrate, measuring a thickness of a target object, or a depth of etching, formed on the substrate,
wherein in the length measuring step, an etching angle made by a cross section of the etching and the direction perpendicular to the plane of the substrate is calculated from processing data of the target object, and the thickness of the target object or the depth of the etching is measured on the basis of the calculated etching angle, and
wherein information about a processing recipe used when the target object is formed on the substrate includes information about order of light and dark as a contrast used when the cross section of the etching is observed.

2. The device manufacturing method according to claim 1 , wherein in the length measuring step, the thickness of the target object or the depth of the etching is measured on the basis of a database in which conditions of an ion beam of the etching are associated with the etching angle made by the cross section of the etching and the direction perpendicular to the plane of the substrate.

3. The device manufacturing method according to claim 1 , wherein information about a processing recipe used when the target object is formed on the substrate includes information about adjustment of a rotation of a stage on which the substrate is placed.

4. The device manufacturing method according to claim 1 , wherein when the cross section of the etching is observed, a cross section that has been etched more deeply than the film thickness of the target object to be subjected to length measurement is observed.

5. The device manufacturing method according to claim 1 , wherein
the length measuring step comprises:
adjusting a rotation angle of a stage on which the substrate is placed;
manufacturing an edge used when the cross section of the etching is observed;
after the edge is manufactured, observing the cross section of the etching from the direction having the predetermined angle; and
correcting, on the basis of the etching angle, the SEM image obtained by observing the cross section of the etching, and calculating the thickness of the target object or the depth of the etching.

6. The device manufacturing method according to claim 1 , wherein the target object is a MEMS structure.

7. A device manufacturing apparatus comprising:
a Focused Ion Beam (FIB)-Scanning Electron Microscope (SEM) unit that is a combined unit of an FIB unit and an SEM unit; and
a control unit that controls processing and observation in the FIB-SEM unit, wherein
the control unit comprises a length-measuring processing part for, on the basis of an observation target image of an SEM image taken from a direction having a predetermined angle from a direction perpendicular to a plane of a substrate, measuring a thickness of a target object, or a depth of etching, formed on the substrate,
the length-measuring processing part calculates, from processing data of the target object, an etching angle made by a cross section of the etching and the direction perpendicular to the plane of the substrate, and measures the thickness of the target object or the depth of the etching on the basis of the calculated etching angle, and
information about a processing recipe used when the target object is formed on the substrate includes information about order of light and dark as a contrast used when the cross section of the etching is observed.

8. The device manufacturing apparatus according to claim 7 , wherein
the length-measuring processing part calculates the thickness of the target object or the depth of the etching on the basis of a database in which conditions of an ion beam of the etching are associated with the etching angle made by the cross section of the etching and the direction perpendicular to the plane of the substrate.

9. The device manufacturing apparatus according to claim 7 , wherein information about a processing recipe used when the target object is formed on the substrate includes information about adjustment of a rotation of a stage on which the substrate is placed.

10. The device manufacturing apparatus according to claim 7 , wherein when the cross section of the etching is observed, a cross section that has been etched more deeply than the film thickness of the target object to be subjected to length measurement is observed.

11. The device manufacturing apparatus according to claim 7 , wherein on the basis of the control by the control unit,
the FIB-SEM unit adjusts a rotation angle of a stage on which the substrate is placed, manufactures an edge used when the cross section of the etching is observed, and after the edge is manufactured, observes the cross section of the etching from the direction having the predetermined angle, and
the length-measuring processing part corrects, on the basis of the etching angle, the SEM image obtained by observing the cross section of the etching, and calculates the thickness of the target object or the depth of the etching.

12. The device manufacturing apparatus according to claim 7 , wherein the target object is a MEMS structure.

Assignees

• Hitachi Ltd

Inventors

• Sagawa Misuzu
• Kawamura Tetsufumi

Classifications

• H10P72/0606

  Position monitoring, e.g. misposition detection or presence detection · CPC title

• H10P72/0604

  Process monitoring, e.g. flow or thickness monitoring · CPC title

• H10P72/0421

  for drying etching · CPC title

• H10P50/642

  Chemical etching · CPC title

• H10P74/23 Primary

  characterised by multiple measurements, corrections, marking or sorting processes · CPC title