Method for obtaining training data for training a model of a semiconductor manufacturing process
US-12591177-B2 · Mar 31, 2026 · US
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Werkman Roy patents
Werkman Roy is listed as an inventor on 53 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Werkman Roy |
| Total patents | 53 |
| First publication | Jan 11, 2018 |
| Latest publication | Mar 31, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Method for determining a sampling scheme, a semiconductor substrate measurement apparatus, a lithographic apparatus
US-12578653-B2 · Mar 17, 2026 · US
Determining a correction to a process
US-12493285-B2 · Dec 9, 2025 · US
Methods and apparatus for controlling a lithographic process
US-12366809-B2 · Jul 22, 2025 · US
Methods of metrology and associated devices
US-2025199419-A1 · Jun 19, 2025 · US
Method for controlling a semiconductor manufacturing process
US-12276919-B2 · Apr 15, 2025 · US
Method of wafer alignment using at resolution metrology on product features
US-12124179-B2 · Oct 22, 2024 · US
Determining a correction to a process
US-2024345569-A1 · Oct 17, 2024 · US
Method of determining a correction for at least one control parameter in a semiconductor manufacturing process
US-2024310738-A1 · Sep 19, 2024 · US
Causal convolution network for process control
US-2024184254-A1 · Jun 6, 2024 · US
Recent patents
Latest publications not already listed above.
Determining a correction to a process
US-11994845-B2 · May 28, 2024 · US
Method of determining at least a target layout and associated metrology apparatus
US-2024036479-A1 · Feb 1, 2024 · US
Methods and computer programs for configuration of a sampling scheme generation model
US-2023400778-A1 · Dec 14, 2023 · US
Target structure and associated methods and apparatus
US-2023333485-A1 · Oct 19, 2023 · US
Method for determining corrections for lithographic apparatus
US-11754931-B2 · Sep 12, 2023 · US
Method for controlling a manufacturing apparatus and associated apparatuses
US-11669017-B2 · Jun 6, 2023 · US
Method of wafer alignment using at resolution metrology on product features
US-2023168594-A1 · Jun 1, 2023 · US
Method and apparatus for determining control data for a lithographic apparatus
US-2022413391-A1 · Dec 29, 2022 · US
Method for determining contribution to a fingerprint
US-2022342319-A1 · Oct 27, 2022 · US
Method and apparatus for lithographic process performance determination
US-2022291593-A1 · Sep 15, 2022 · US
Optimizing a sequence of processes for manufacturing of product units
US-11442367-B2 · Sep 13, 2022 · US
Method of determining a set of metrology points on a substrate, associated apparatus and computer program
US-11435673-B2 · Sep 6, 2022 · US
Method for determining a sampling scheme, a semiconductor substrate measurement apparatus, a lithographic apparatus
US-2022260920-A1 · Aug 18, 2022 · US
Method for determining corrections for lithographic apparatus
US-2022252988-A1 · Aug 11, 2022 · US
Method for controlling a semiconductor manufacturing process
US-2022236647-A1 · Jul 28, 2022 · US
Method for determining contribution to a fingerprint
US-11378891-B2 · Jul 5, 2022 · US
Method for evaluating control strategies in a semiconductor manufacturing process
US-11372338-B2 · Jun 28, 2022 · US
Method of determining a set of metrology points on a substrate, associated apparatus and computer program
US-2022155698-A1 · May 19, 2022 · US
Estimating a parameter of a substrate
US-11327406-B2 · May 10, 2022 · US
Method to change an etch parameter
US-11300887-B2 · Apr 12, 2022 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Asml Netherlands Bv | 53 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/70525 | 36 |
| G03F7/70633 | 32 |
| G03F7/705 | 32 |
| G03F7/70616 | 22 |
| G03F7/706837 | 18 |