Chemical mechanical polishing pad
US-10875144-B2 · Dec 29, 2020 · US
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Wang Te-Chun patents
Wang Te-Chun is listed as an inventor on 3 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Wang Te-Chun |
| Total patents | 3 |
| First publication | Oct 4, 2018 |
| Latest publication | Dec 29, 2020 |
Notable patents
Publications ranked by popularity score, then publication date.
Chemical mechanical polishing pad
US-2018361531-A1 · Dec 20, 2018 · US
Chemical mechanical polishing pad
US-2018281149-A1 · Oct 4, 2018 · US
Recent patents
Latest publications not already listed above.
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Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Rohm & Haas Elect Materials Cmp Holdings Inc | 3 |
| Dow Global Technologies Llc | 3 |
| Rohm And Haas Electronic Mat Cmp Holdings I | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P52/403 | 3 |
| H01L21/3212 | 3 |
| B24B37/24 | 3 |
| C08G18/10 | 3 |
| C08L75/04 | 3 |