Composition and process for selectively etching a hard mask and/or an etch-stop layer in the presence of layers of low-k materials, copper, cobalt and/or tungsten
US-12590274-B2 · Mar 31, 2026 · US
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Wang Che Wei patents
Wang Che Wei is listed as an inventor on 5 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Wang Che Wei |
| Total patents | 5 |
| First publication | Oct 29, 2020 |
| Latest publication | Mar 31, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Composition and process for selectively etching a layer comprising an aluminium compound in the presence of layers of low-k materials, copper and/or cobalt
US-12331239-B2 · Jun 17, 2025 · US
Composition and process for selectively etching a layer comprising an aluminium compound in the presence of layers of low-k materials, copper and/or cobalt
US-2024093089-A1 · Mar 21, 2024 · US
Composition and process for electively etching a hard mask and/or an etch-stop layer in the presence of layers of low-k materials, copper, cobalt and/or tungsten
US-2022220421-A1 · Jul 14, 2022 · US
Composition and process for selectively etching a layer comprising an aluminium compound in the presence of layers of low-k materials, copper and/or cobalt
US-2020339523-A1 · Oct 29, 2020 · US
Recent patents
Latest publications not already listed above.
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Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Basf Se | 5 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| C09K13/00 | 5 |
| H10P50/283 | 3 |
| C09K13/08 | 3 |
| C07D265/30 | 3 |
| C09K13/10 | 3 |