Etchant composition and method
US-2023383185-A1 · Nov 30, 2023 · US
containing a boron compound
containing a boron compound · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C09K13/10 |
| Official title | containing a boron compound |
| Display label | containing a boron compound |
| Total patents | 83 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 3 |
| 2016 | 4 |
| 2017 | 5 |
| 2018 | 5 |
| 2019 | 12 |
| 2020 | 9 |
| 2021 | 5 |
| 2022 | 14 |
| 2023 | 11 |
| 2024 | 5 |
| 2025 | 10 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Method for removing hard masks
US-11788007-B2 · Oct 17, 2023 · US
Thermal atomic layer etching processes
US-11739428-B2 · Aug 29, 2023 · US
Non-phosphoric acid-based silicon nitride film etching composition and etching method using the same
US-11521859-B2 · Dec 6, 2022 · US
Etchant for etching a cobalt-containing member in a semiconductor structure and method of etching a cobalt-containing member in a semiconductor structure
US-2022367206-A1 · Nov 17, 2022 · US
Etching solution for tungsten word line recess
US-11499236-B2 · Nov 15, 2022 · US
Etchant for etching a cobalt-containing member in a semiconductor structure and method of etching a cobalt-containing member in a semiconductor structure
US-11476124-B2 · Oct 18, 2022 · US
Non-phosphoric acid-based silicon nitride film etching composition and etching method using the same
US-2022235267-A1 · Jul 28, 2022 · US
Etchant for etching a cobalt-containing member in a semiconductor structure and method of etching a cobalt-containing member in a semiconductor structure
US-2022216066-A1 · Jul 7, 2022 · US
Dry Etching Method and Method for Producing Semiconductor Device
US-2022157614-A1 · May 19, 2022 · US
Thermal atomic layer etching processes
US-2022119961-A1 · Apr 21, 2022 · US
Thermal atomic layer etching processes
US-2022119962-A1 · Apr 21, 2022 · US
Etching solution, additive, and etching method
US-11254870-B2 · Feb 22, 2022 · US
Method for removing hard masks
US-2022033709-A1 · Feb 3, 2022 · US
Cleaning solution composition and cleaning method using the same
US-2022025299-A1 · Jan 27, 2022 · US
Thermal atomic layer etching processes
US-11230769-B2 · Jan 25, 2022 · US
Thermal atomic layer etching processes
US-11230770-B2 · Jan 25, 2022 · US
Etching compositions
US-2021371748-A1 · Dec 2, 2021 · US
Etching compositions
US-11124704-B2 · Sep 21, 2021 · US
Etching compositions
US-2021214612-A1 · Jul 15, 2021 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C09K13/10?
- CPC C09K13/10 is the Cooperative Patent Classification code for “containing a boron compound.”
- How many patents are filed under CPC C09K13/10 (containing a boron compound)?
- Our database includes 83 publications tagged with this CPC code.
- Is patent activity under CPC C09K13/10 growing?
- Publication counts under this code: 5 in 2024 vs 10 in 2025 (latest complete years).