Coating compositions and methods to enhance SC-1 resistance
US-12482656-B2 · Nov 25, 2025 · US
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Sweat Daniel Patrick patents
Sweat Daniel Patrick is listed as an inventor on 18 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Sweat Daniel Patrick |
| Total patents | 18 |
| First publication | Apr 7, 2015 |
| Latest publication | Nov 25, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Solubility switch topographic fill materials and methods
US-2025293030-A1 · Sep 18, 2025 · US
Acidic spin-on carbon (soc) layer for euv lithography
US-2025208517-A1 · Jun 26, 2025 · US
Methods for global planarization
US-2025096005-A1 · Mar 20, 2025 · US
Catalyst-free crosslinking of propiolate-ester-functionalized molecules and polymers
US-2025068077-A1 · Feb 27, 2025 · US
Euv-induced condensation of polysiloxane sol-gel thin film
US-2024134281-A1 · Apr 25, 2024 · US
Thermally decomposable fill material
US-2024030063-A1 · Jan 25, 2024 · US
Coating compositions and methods to enhance sc-1 resistance
US-2023282478-A1 · Sep 7, 2023 · US
Gradient block copolymers for directed self-assembly
US-10961383-B2 · Mar 30, 2021 · US
Block copolymers with high flory-huggins interaction parameters for block copolymer lithography
US-10913873-B2 · Feb 9, 2021 · US
Recent patents
Latest publications not already listed above.
Methods of making crosslinked copolymer films from inimer-containing random copolymers
US-10465087-B2 · Nov 5, 2019 · US
Gradient block copolymers for directed self-assembly
US-2019233636-A1 · Aug 1, 2019 · US
Methods of making crosslinked copolymer films from inimer-containing random copolymers
US-2017145139-A1 · May 25, 2017 · US
Block copolymers with high flory-huggins interaction parameters for block copolymer lithography
US-2017121555-A1 · May 4, 2017 · US
Block copolymers with high Flory-Huggins interaction parameters for block copolymer lithography
US-9587136-B2 · Mar 7, 2017 · US
Block copolymer-based mask structures for the growth of nanopatterned polymer brushes
US-9097979-B2 · Aug 4, 2015 · US
Block copolymers with high flory-huggins interaction parameters for block copolymer lithography
US-2015099109-A1 · Apr 9, 2015 · US
Degradable neutral layers for block copolymer lithography applications
US-8999623-B2 · Apr 7, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Brewer Science Inc | 10 |
| Wisconsin Alumni Res Found | 8 |
| Wisconsin Alumni Res Fond | 1 |
| Wiscousin Alumni Res Foundation | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/0002 | 7 |
| C09D153/00 | 5 |
| C08F297/046 | 4 |
| C08F297/02 | 4 |
| C08F297/026 | 4 |