Processing method for silicon carbide single crystal substrate, silicon carbide single crystal substrate processing system, and replenishing liquid
US-2025369155-A1 · Dec 4, 2025 · US
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Shimura Eiichi patents
Shimura Eiichi is listed as an inventor on 7 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Shimura Eiichi |
| Total patents | 7 |
| First publication | Jan 26, 2016 |
| Latest publication | Dec 4, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Method of forming resist pattern, resist composition and method of producing the same
US-11754926-B2 · Sep 12, 2023 · US
Resist pattern formation method
US-2023127914-A1 · Apr 27, 2023 · US
Method of forming resist pattern, resist composition and method of producing the same
US-2020150541-A1 · May 14, 2020 · US
Method for forming photosensitive resin layer, method for producing photoresist pattern, and method for producing plated molded article
US-10353291-B2 · Jul 16, 2019 · US
Method for forming photosensitive resin layer, method for producing photoresist pattern, and method for producing plated molded article
US-2016274459-A1 · Sep 22, 2016 · US
Method for producing thick film photoresist pattern
US-9244354-B2 · Jan 26, 2016 · US
Recent patents
Latest publications not already listed above.
No data yet.
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Tokyo Ohka Kogyo Co Ltd | 7 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/0392 | 6 |
| G03F7/20 | 5 |
| G03F7/0397 | 5 |
| G03F7/32 | 4 |
| G03F7/0045 | 3 |