Metrology mark structure and method of determining metrology mark structure
US-12585201-B2 · Mar 24, 2026 · US
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Roux Stephen patents
Roux Stephen is listed as an inventor on 33 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Roux Stephen |
| Total patents | 33 |
| First publication | Jul 30, 2015 |
| Latest publication | Mar 24, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
A movable stage for a lithographic apparatus
US-2025298326-A1 · Sep 25, 2025 · US
Method and apparatus for particle removal
US-2025296128-A1 · Sep 25, 2025 · US
Systems and methods for measuring intensity in a lithographic alignment apparatus
US-12399000-B2 · Aug 26, 2025 · US
Monolithic particle inspection device
US-12298257-B2 · May 13, 2025 · US
Lithographic apparatus, metrology systems, and methods thereof
US-12287591-B2 · Apr 29, 2025 · US
Intensity measurements using off-axis illumination
US-2025130512-A1 · Apr 24, 2025 · US
An optical system implemented in a system for fast optical inspection of targets
US-2025060684-A1 · Feb 20, 2025 · US
Self-referencing integrated alignment sensor
US-12216414-B2 · Feb 4, 2025 · US
Optical designs of miniaturized overlay measurement system
US-12140872-B2 · Nov 12, 2024 · US
Recent patents
Latest publications not already listed above.
Spectrometric metrology systems based on multimode interference and lithographic apparatus
US-12135505-B2 · Nov 5, 2024 · US
On chip sensor for wafer overlay measurement
US-2024361703-A1 · Oct 31, 2024 · US
Metrology systems with phased arrays for contaminant detection and microscopy
US-2024319617-A1 · Sep 26, 2024 · US
On chip sensor for wafer overlay measurement
US-12066762-B2 · Aug 20, 2024 · US
Lithographic apparatus, metrology systems, phased array illumination sources and methods thereof
US-11994808-B2 · May 28, 2024 · US
Systems and methods for measuring intensity in a lithographic alignment apparatus
US-2024077308-A1 · Mar 7, 2024 · US
Lithographic apparatus, metrology systems, and methods thereof
US-2024036485-A1 · Feb 1, 2024 · US
Spectrometric metrology systems based on multimode interference and lithographic apparatus
US-2023273531-A1 · Aug 31, 2023 · US
Monolithic particle inspection device
US-2023266255-A1 · Aug 24, 2023 · US
Self-referencing integrated alignment sensor
US-2023266681-A1 · Aug 24, 2023 · US
Optical designs of miniaturized overlay measurement system
US-2023059471-A1 · Feb 23, 2023 · US
Reticle sub-field thermal control
US-11500298-B2 · Nov 15, 2022 · US
Metrology mark structure and method of determining metrology mark structure
US-2022350268-A1 · Nov 3, 2022 · US
On chip sensor for wafer overlay measurement
US-2022283516-A1 · Sep 8, 2022 · US
Assembly for use in semiconductor photolithography and method of manufacturing same
US-11415893-B2 · Aug 16, 2022 · US
Reticle sub-field thermal control
US-2022057723-A1 · Feb 24, 2022 · US
Assembly for Use in Semiconductor Photolithography and Method of Manufacturing Same
US-2021181640-A1 · Jun 17, 2021 · US
Mask assembly
US-11009803-B2 · May 18, 2021 · US
Lithographic Apparatus, Metrology Systems, Phased Array Illumination Sources and Methods thereof
US-2021095957-A1 · Apr 1, 2021 · US
Mask Assembly
US-2020057394-A1 · Feb 20, 2020 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Asml Holding Nv | 28 |
| Asml Netherlands Bv | 17 |
| Asml Netherlands B V & Asml Holding N V | 1 |
| Asml Holding N V & Asml Netherlands B V | 1 |
| Asml Netheriands B V | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/70633 | 14 |
| G03F9/7065 | 9 |
| G03F9/7088 | 8 |
| G03F7/7085 | 6 |
| G03F7/70616 | 6 |