Chemical mechanical polishing pad with polishing layer and window
US-9259820-B2 · Feb 16, 2016 · US
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Murnane James patents
Murnane James is listed as an inventor on 12 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Murnane James |
| Total patents | 12 |
| First publication | Mar 5, 2015 |
| Latest publication | Feb 16, 2016 |
Notable patents
Publications ranked by popularity score, then publication date.
Multilayer chemical mechanical polishing pad stack with soft and conditionable polishing layer
US-9238296-B2 · Jan 19, 2016 · US
Soft and conditionable chemical mechanical window polishing pad
US-9238295-B2 · Jan 19, 2016 · US
Soft and conditionable chemical mechanical polishing pad stack
US-9233451-B2 · Jan 12, 2016 · US
Chemical mechanical polishing pad with polishing layer and window
US-2015273652-A1 · Oct 1, 2015 · US
Soft and conditionable chemical mechanical polishing pad
US-9144880-B2 · Sep 29, 2015 · US
Method of chemical mechanical polishing a substrate
US-9102034-B2 · Aug 11, 2015 · US
Soft and conditionable chemical mechanical polishing pad with window
US-9064806-B1 · Jun 23, 2015 · US
Method for chemical mechanical polishing silicon wafers
US-8980749-B1 · Mar 17, 2015 · US
Polyurethane polishing pad
US-2015059254-A1 · Mar 5, 2015 · US
Recent patents
Latest publications not already listed above.
Method of chemical mechanical polishing a substrate
US-2015065014-A1 · Mar 5, 2015 · US
Chemical mechanical polishing pad
US-2015065013-A1 · Mar 5, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Rohm & Haas Elect Mat | 12 |
| Dow Global Technologies Llc | 10 |
| Rohm And Haas Electronics Materials Cmp Holdings Inc | 1 |
| Nitta Haas Inc | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| B24B37/24 | 10 |
| B24B37/205 | 8 |
| B24B37/22 | 7 |
| C08G18/10 | 5 |
| B24B37/245 | 4 |