Laminate, process for manufacturing laminate, and patterning process
US-2026056472-A1 · Feb 26, 2026 · US
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Mitsui Ryo patents
Mitsui Ryo is listed as an inventor on 28 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Mitsui Ryo |
| Total patents | 28 |
| First publication | Mar 1, 2018 |
| Latest publication | Feb 26, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Composition for forming silicon-containing resist film and patterning process
US-2026044081-A1 · Feb 12, 2026 · US
Composition for forming silicon-containing film, method for forming film, and super straight
US-2026029706-A1 · Jan 29, 2026 · US
Benzenesulfonic acid salt compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process
US-2025383600-A1 · Dec 18, 2025 · US
Polyvalent ammonium salt compound, composition for forming silicon-containing resist underlayer film, and patterning process
US-2025289931-A1 · Sep 18, 2025 · US
Silicon-containing sulfonium salt compound, composition for forming a silicon-containing resist underlayer film, and patterning process
US-2025237953-A1 · Jul 24, 2025 · US
Composition For Forming Silicon-Containing Anti-Reflective Film And Patterning Method
US-2025218768-A1 · Jul 3, 2025 · US
Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process
US-12332565-B2 · Jun 17, 2025 · US
Patterning Process
US-2025166999-A1 · May 22, 2025 · US
Composition For Forming Silicon-Containing Resist Underlayer Film And Patterning Process
US-2024319598-A1 · Sep 26, 2024 · US
Recent patents
Latest publications not already listed above.
Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process
US-11914295-B2 · Feb 27, 2024 · US
Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for euv lithography, and patterning process
US-2023333472-A1 · Oct 19, 2023 · US
Composition for forming silicon-containing metal hard mask and patterning process
US-2023305405-A1 · Sep 28, 2023 · US
Thermosetting silicon-containing compound, composition for forming a silicon-containing film, and patterning process
US-11485824-B2 · Nov 1, 2022 · US
Sulfonium compound, resist composition, and patterning process
US-11215926-B2 · Jan 4, 2022 · US
Sulfonium salt, resist composition, and patterning process
US-10754248-B2 · Aug 25, 2020 · US
Silicon-containing compound, urethane resin, stretchable film, and method for forming the same
US-10717804-B2 · Jul 21, 2020 · US
Thermosetting silicon-containing compound, composition for forming a silicon-containing film, and patterning process
US-2020216670-A1 · Jul 9, 2020 · US
Silicon-containing compound, urethane resin, stretchable film, and method for forming the same
US-10696779-B2 · Jun 30, 2020 · US
Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for euv lithography, and patterning process
US-2020159120-A1 · May 21, 2020 · US
Method for producing silicon compound, and silicon compound
US-2020115400-A1 · Apr 16, 2020 · US
Patterning process
US-2020090935-A1 · Mar 19, 2020 · US
Silicon-containing compound, urethane resin, stretchable film, and method for forming the same
US-2019112413-A1 · Apr 18, 2019 · US
Silicon-containing compound, urethane resin, stretchable film, and method for forming the same
US-2019106528-A1 · Apr 11, 2019 · US
Sulfonium compound, resist composition, and patterning process
US-2019064665-A1 · Feb 28, 2019 · US
Sulfonium salt, resist composition, and patterning process
US-2018275516-A1 · Sep 27, 2018 · US
Sulfonium compound, resist composition, and patterning process
US-10025180-B2 · Jul 17, 2018 · US
Sulfonium compound, resist composition, and patterning process
US-2018059543-A1 · Mar 1, 2018 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Shinetsu Chemical Co | 28 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/11 | 19 |
| G03F7/0757 | 16 |
| G03F7/094 | 15 |
| G03F7/0752 | 14 |
| G03F7/004 | 11 |