Sleeve for retention of a surgical port comprising flanges that are reversibly radially expandable
US-12594409-B2 · Apr 7, 2026 · US
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Marks Jeffrey patents
Marks Jeffrey is listed as an inventor on 90 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Marks Jeffrey |
| Total patents | 90 |
| First publication | Mar 19, 2015 |
| Latest publication | Apr 7, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Photoresist development with halide chemistries
US-2026072349-A1 · Mar 12, 2026 · US
Plasma etching chemistries of high aspect ratio features in dielectrics
US-12550660-B2 · Feb 10, 2026 · US
Sleeve for retention of a surgical port comprising flanges that are reversibly radially expandable
US-2026000882-A1 · Jan 1, 2026 · US
Photoresist development with halide chemistries
US-12510826-B2 · Dec 30, 2025 · US
Photoresist development with halide chemistries
US-12510825-B2 · Dec 30, 2025 · US
Endoscopic multifunctional accessory channel device
US-12419499-B2 · Sep 23, 2025 · US
Endoscopic tissue resection device
US-12376875-B2 · Aug 5, 2025 · US
Vacuum-integrated hardmask processes and apparatus
US-2025053080-A1 · Feb 13, 2025 · US
Sleeve for retention of a surgical port comprising flanges that are reversibly radially expandable
US-2025041578-A1 · Feb 6, 2025 · US
Recent patents
Latest publications not already listed above.
Photoresist development with halide chemistries
US-2024419078-A1 · Dec 19, 2024 · US
Photoresist development with halide chemistries
US-2024361696-A1 · Oct 31, 2024 · US
Plasma etching chemistries of high aspect ratio features in dielectrics
US-12119243-B2 · Oct 15, 2024 · US
Photoresist development with halide chemistries
US-12105422-B2 · Oct 1, 2024 · US
Endoscopic multifunctional accessory channel device
US-2024306894-A1 · Sep 19, 2024 · US
Plasma etching chemistries of high aspect ratio features in dielectrics
US-2024258128-A1 · Aug 1, 2024 · US
Plasma etching chemistries of high aspect ratio features in dielectrics
US-2024258127-A1 · Aug 1, 2024 · US
Plasma etching chemistries of high aspect ratio features in dielectrics
US-2024203759-A1 · Jun 20, 2024 · US
Plasma etching chemistries of high aspect ratio features in dielectrics
US-2024203760-A1 · Jun 20, 2024 · US
Plasma etching chemistries of high aspect ratio features in dielectrics
US-2024178014-A1 · May 30, 2024 · US
Endoscopic tissue resection device
US-2024090912-A1 · Mar 21, 2024 · US
Vacuum-integrated hardmask processes and apparatus
US-2023273516-A1 · Aug 31, 2023 · US
Vacuum-integrated hardmask processes and apparatus
US-2023266662-A1 · Aug 24, 2023 · US
Plasma etching chemistries of high aspect ratio features in dielectrics
US-2023187234-A1 · Jun 15, 2023 · US
Bioassay substrate having fiducial domains and methods of manufacture thereof
US-2023149931-A1 · May 18, 2023 · US
Plasma etching chemistries of high aspect ratio features in dielectrics
US-11594429-B2 · Feb 28, 2023 · US
Photoresist development with halide chemistries
US-2022244645-A1 · Aug 4, 2022 · US
Vacuum-integrated hardmask processes and apparatus
US-2022075260-A1 · Mar 10, 2022 · US
Vacuum-integrated hardmask processes and apparatus
US-11209729-B2 · Dec 28, 2021 · US
Methods and apparatus for extended dynamic range from single exposures in capillary electrophoresis
US-10902593-B2 · Jan 26, 2021 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Lam Res Corp | 64 |
| Life Technologies Corp | 19 |
| Univ Hospitals Cleveland Medical Center | 7 |
| Nanostring Technologies Inc | 1 |
| Life Technolgies Corp | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P76/4085 | 25 |
| H10P72/0421 | 23 |
| H10P50/73 | 22 |
| H01L21/67069 | 22 |
| H10P50/283 | 21 |