Method of forming a metal layer and method of manufacturing a substrate having such metal layer
US-9988730-B2 · Jun 5, 2018 · US
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Ishikawa Hitoshi patents
Ishikawa Hitoshi is listed as an inventor on 2 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Ishikawa Hitoshi |
| Total patents | 2 |
| First publication | May 11, 2017 |
| Latest publication | Jun 5, 2018 |
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Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Atotech Deutschland Gmbh | 2 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H05K3/424 | 2 |
| H05K3/427 | 2 |
| H05K2201/032 | 2 |
| H05K2203/0796 | 2 |
| H05K1/0296 | 2 |