In-situ etch rate and etch rate uniformity detection system
US-12489022-B2 · Dec 2, 2025 · US
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Erickson Blake patents
Erickson Blake is listed as an inventor on 33 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Erickson Blake |
| Total patents | 33 |
| First publication | Oct 29, 2020 |
| Latest publication | Dec 2, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Smart camera substrate
US-12432461-B2 · Sep 30, 2025 · US
Spatial optical emission spectroscopy for etch uniformity
US-12405164-B2 · Sep 2, 2025 · US
Substrate measurement subsystem
US-2025218829-A1 · Jul 3, 2025 · US
Substrate measurement subsystem
US-12283503-B2 · Apr 22, 2025 · US
Integrated substrate measurement system to improve manufacturing process performance
US-12191176-B2 · Jan 7, 2025 · US
Smart camera substrate
US-2024365013-A1 · Oct 31, 2024 · US
Smart camera substrate
US-12114083-B2 · Oct 8, 2024 · US
In-situ etch material selectivity detection system
US-2024096715-A1 · Mar 21, 2024 · US
Multiple reflectometry for measuring etch parameters
US-11927543-B2 · Mar 12, 2024 · US
Recent patents
Latest publications not already listed above.
In-situ etch material selectivity detection system
US-11830779-B2 · Nov 28, 2023 · US
Smart camera substrate
US-2023345137-A1 · Oct 26, 2023 · US
Integrated substrate measurement system to improve manufacturing process performance
US-2023326773-A1 · Oct 12, 2023 · US
Smart camera substrate
US-11736818-B2 · Aug 22, 2023 · US
Spatial optical emission spectroscopy for etch uniformity
US-2023258500-A1 · Aug 17, 2023 · US
Integrated substrate measurement system to improve manufacturing process performance
US-11688616-B2 · Jun 27, 2023 · US
Spatial optical emission spectroscopy for etch uniformity
US-11668602-B2 · Jun 6, 2023 · US
Multiple reflectometry for measuring etch parameters
US-2023168210-A1 · Jun 1, 2023 · US
Multiple reflectometry for measuring etch parameters
US-11619594-B2 · Apr 4, 2023 · US
Determining substrate profile properties using machine learning
US-2023062206-A1 · Mar 2, 2023 · US
Portion of a display panel with a graphical user interface
US-D977504-S · Feb 7, 2023 · US
Multiple reflectometry for measuring etch parameters
US-2022349833-A1 · Nov 3, 2022 · US
Spatial optical emission spectroscopy for etch uniformity
US-2022333989-A1 · Oct 20, 2022 · US
Smart camera substrate
US-2022272278-A1 · Aug 25, 2022 · US
Smart camera substrate
US-11284018-B1 · Mar 22, 2022 · US
Smart camera substrate
US-2022086364-A1 · Mar 17, 2022 · US
Detecting and correcting substrate process drift using machine learning
US-2022066411-A1 · Mar 3, 2022 · US
In-situ etch material selectivity detection system
US-2022051954-A1 · Feb 17, 2022 · US
In-situ etch rate and etch rate uniformity detection system
US-2022051953-A1 · Feb 17, 2022 · US
Integrated substrate measurement system to improve manufacturing process performance
US-2022028713-A1 · Jan 27, 2022 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Applied Materials Inc | 33 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P72/0604 | 12 |
| H10P72/0612 | 11 |
| G01N21/9501 | 11 |
| H01L21/67276 | 11 |
| H10P74/238 | 9 |