Method for high aspect ratio photoresist removal in pure reducing plasma
US-11107693-B2 · Aug 31, 2021 · US
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Diao Li patents
Diao Li is listed as an inventor on 6 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Diao Li |
| Total patents | 6 |
| First publication | May 7, 2015 |
| Latest publication | Aug 31, 2021 |
Notable patents
Publications ranked by popularity score, then publication date.
Method for High Aspect Ratio Photoresist Removal in Pure Reducing Plasma
US-2020098576-A1 · Mar 26, 2020 · US
Method for high aspect ratio photoresist removal in pure reducing plasma
US-10431469-B2 · Oct 1, 2019 · US
Mask removal process strategy for vertical NAND device
US-9396963-B2 · Jul 19, 2016 · US
Method for High Aspect Ratio Photoresist Removal in Pure Reducing Plasma
US-2015144155-A1 · May 28, 2015 · US
Novel Mask Removal Process Strategy for Vertical NAND Device
US-2015126035-A1 · May 7, 2015 · US
Recent patents
Latest publications not already listed above.
No data yet.
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Mattson Tech Inc | 6 |
| Beijing E Town Semiconductor Tech Co Ltd | 2 |
| Mattson Technology | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H01J37/321 | 6 |
| H10P70/27 | 4 |
| H10P50/287 | 4 |
| H10P50/242 | 4 |
| H01J2237/334 | 4 |