Composition and method for manufacturing semiconductor substrate
US-2026079401-A1 · Mar 19, 2026 · US
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Dei Satoshi patents
Dei Satoshi is listed as an inventor on 17 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Dei Satoshi |
| Total patents | 17 |
| First publication | Feb 19, 2015 |
| Latest publication | Mar 19, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Composition, method of forming resist underlayer film, and method of forming resist pattern
US-12572075-B2 · Mar 10, 2026 · US
Resist underlayer film-forming composition, and method for manufacturing semiconductor substrate
US-2025251666-A1 · Aug 7, 2025 · US
Method for forming protective film, method for manufacturing patterned substrate, and composition
US-12312487-B2 · May 27, 2025 · US
Semiconductor substrate manufacturing method, and resist base film forming composition
US-2025110407-A1 · Apr 3, 2025 · US
Method for manufacturing semiconductor substrate, and composition
US-2024288773-A1 · Aug 29, 2024 · US
Method for manufacturing semiconductor substrate and composition
US-2024255852-A1 · Aug 1, 2024 · US
Semiconductor substrate manufacturing method and composition
US-2024142876-A1 · May 2, 2024 · US
Method for forming protective film, method for manufacturing patterned substrate, and composition
US-2023242787-A1 · Aug 3, 2023 · US
Composition, method of forming resist underlayer film, and method of forming resist pattern
US-2023041656-A1 · Feb 9, 2023 · US
Recent patents
Latest publications not already listed above.
Inorganic film-forming composition for multilayer resist processes, and pattern-forming method
US-10090163-B2 · Oct 2, 2018 · US
Method for forming pattern, and polysiloxane composition
US-9434609-B2 · Sep 6, 2016 · US
Polysiloxane composition and pattern-forming method
US-9329478-B2 · May 3, 2016 · US
Inorganic film-forming composition for multilayer resist processes, and pattern-forming method
US-2015364332-A1 · Dec 17, 2015 · US
Composition for silicon-containing film formation, pattern-forming method, and polysiloxane compound
US-2015355546-A1 · Dec 10, 2015 · US
Insulation pattern-forming method and insulation pattern-forming material
US-9126231-B2 · Sep 8, 2015 · US
Method for forming pattern, and polysiloxane composition
US-2015048046-A1 · Feb 19, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/11 | 13 |
| G03F7/094 | 10 |
| G03F7/20 | 9 |
| G03F7/039 | 7 |
| H10P76/2041 | 5 |