Process for producing silicon-containing materials in a stirred-tank reactor
US-12570533-B2 · Mar 10, 2026 · US
This page is not indexed by search engines while we improve data quality.
Becker Moritz patents
Becker Moritz is listed as an inventor on 27 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Becker Moritz |
| Total patents | 27 |
| First publication | Jul 21, 2016 |
| Latest publication | Mar 10, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Euv optics module for an euv projection exposure apparatus
US-2025278025-A1 · Sep 4, 2025 · US
Projection exposure apparatus having a device for determining the concentration of atomic hydrogen
US-12306551-B2 · May 20, 2025 · US
Method for operating an EUV lithography apparatus, and EUV lithography apparatus
US-12287588-B2 · Apr 29, 2025 · US
Process for producing silicon-containing materials in a stirred-tank reactor
US-2024376594-A1 · Nov 14, 2024 · US
Apparatus and method for avoiding a degradation of an optical used surface of a mirror module, projection system, illumination system and projection exposure apparatus
US-2024319621-A1 · Sep 26, 2024 · US
Method for depositing a cover layer, euv lithography system and optical element
US-2024302756-A1 · Sep 12, 2024 · US
Electron microscope for examining a specimen
US-2024302304-A1 · Sep 12, 2024 · US
Multi-mirror array
US-2024248408-A1 · Jul 25, 2024 · US
Process for manufacturing silicon-containing materials
US-2023416907-A1 · Dec 28, 2023 · US
Recent patents
Latest publications not already listed above.
Method for operating an euv lithographty apparatus, and euv lithography apparatus
US-2023041588-A1 · Feb 9, 2023 · US
Projection exposure apparatus having a device for determining the concentration of atomic hydrogen
US-2022308457-A1 · Sep 29, 2022 · US
Method for operating an optical apparatus, and optical apparatus
US-11307505-B2 · Apr 19, 2022 · US
Method for removing a contamination layer by an atomic layer etching process
US-11199363-B2 · Dec 14, 2021 · US
Optical arrangement for EUV radiation with a shield for protection against the etching effect of a plasma
US-11137687-B2 · Oct 5, 2021 · US
Projection exposure system for semiconductor lithography, comprising elements for plasma conditioning
US-10712677-B2 · Jul 14, 2020 · US
Method for operating an optical apparatus, and optical apparatus
US-2020183292-A1 · Jun 11, 2020 · US
Optical arrangement for euv radiation with a shield for protection against the etching effect of a plasma
US-2020166847-A1 · May 28, 2020 · US
Reflective optical element for EUV lithography
US-10649340-B2 · May 12, 2020 · US
Method for removing a contamination layer by an atomic layer etching process
US-2020142327-A1 · May 7, 2020 · US
Method for determining the thickness of a contaminating layer and/or the type of contaminating material, optical element and EUV-lithography system
US-10627217-B2 · Apr 21, 2020 · US
Projection exposure system for semiconductor lithography, comprising elements for plasma conditioning
US-2019243258-A1 · Aug 8, 2019 · US
Reflective optical element for euv lithography
US-2019171108-A1 · Jun 6, 2019 · US
Reflective optical element
US-10061205-B2 · Aug 28, 2018 · US
Method for determining the thickness of a contaminating layer and/or the type of contaminating material, optical element and euv-lithography system
US-2017292830-A1 · Oct 12, 2017 · US
Reflective optical element
US-2017160639-A1 · Jun 8, 2017 · US
Optical arrangement, in particular plasma light source or euv lithography system
US-2016207078-A1 · Jul 21, 2016 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Zeiss Carl Smt Gmbh | 24 |
| Wacker Chemie Ag | 3 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/70925 | 17 |
| G03F7/70916 | 15 |
| G03F7/70033 | 12 |
| G03F7/702 | 11 |
| G03F7/70958 | 9 |