Methods of etching oxygen-containing features at low temperatures
US-2025054770-A1 · Feb 13, 2025 · US
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Patent family 94482401
This patent family groups 1 related publication across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 94482401 |
| Family type | — |
| Earliest priority | Aug 11, 2023 |
| First filing country | US |
| Member publications | 1 |
| Countries | US |
| Representative publication | US2025054770A1 — Methods of etching oxygen-containing features at low temperatures |
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US2025054770A1 — Methods of etching oxygen-containing features at low temperatures (published Feb 13, 2025)
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