Methods and apparatus for forming smooth and conformal cobalt film by atomic layer deposition
US-10242879-B2 · Mar 26, 2019 · US
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Patent family 63854662
This patent family groups 2 related publications across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 63854662 |
| Family type | — |
| Earliest priority | Apr 20, 2017 |
| First filing country | US |
| Member publications | 2 |
| Countries | US |
| Representative publication | US10242879B2 — Methods and apparatus for forming smooth and conformal cobalt film by atomic layer deposition |
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US10242879B2 — Methods and apparatus for forming smooth and conformal cobalt film by atomic layer deposition (published Mar 26, 2019)
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