Selective atomic layer deposition for gapfill using sacrificial underlayer
US-10037884-B2 · Jul 31, 2018 · US
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Patent family 61243195
This patent family groups 2 related publications across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 61243195 |
| Family type | — |
| Earliest priority | Aug 31, 2016 |
| First filing country | US |
| Member publications | 2 |
| Countries | US |
| Representative publication | US10037884B2 — Selective atomic layer deposition for gapfill using sacrificial underlayer |
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US10037884B2 — Selective atomic layer deposition for gapfill using sacrificial underlayer (published Jul 31, 2018)
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