Resist composition, pattern forming process, polymer, and monomer
US-10310376-B2 · Jun 4, 2019 · US
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Patent family 57799443
This patent family groups 2 related publications across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 57799443 |
| Family type | — |
| Earliest priority | Dec 25, 2015 |
| First filing country | US |
| Member publications | 2 |
| Countries | US |
| Representative publication | US10310376B2 — Resist composition, pattern forming process, polymer, and monomer |
Representative publication
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US10310376B2 — Resist composition, pattern forming process, polymer, and monomer (published Jun 4, 2019)
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