Polymer for preparing resist underlayer film, resist underlayer film composition containing the polymer and method for manufacturing semiconductor device using the composition
US-10227450-B2 · Mar 12, 2019 · US
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Patent family 57775586
This patent family groups 2 related publications across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 57775586 |
| Family type | — |
| Earliest priority | Jul 13, 2015 |
| First filing country | US |
| Member publications | 2 |
| Countries | US |
| Representative publication | US10227450B2 — Polymer for preparing resist underlayer film, resist underlayer film composition containing the polymer and method for manufacturing semiconductor device using the composition |
Representative publication
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US10227450B2 — Polymer for preparing resist underlayer film, resist underlayer film composition containing the polymer and method for manufacturing semiconductor device using the composition (published Mar 12, 2019)
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