Composition for forming a silica based layer, method for manufacturing silica based layer, and electronic device including the silica based layer
US-10093830-B2 · Oct 9, 2018 · US
This page is not indexed by search engines while we improve data quality.
Patent family 56128694
This patent family groups 2 related publications across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 56128694 |
| Family type | — |
| Earliest priority | Dec 19, 2014 |
| First filing country | US |
| Member publications | 2 |
| Countries | US |
| Representative publication | US10093830B2 — Composition for forming a silica based layer, method for manufacturing silica based layer, and electronic device including the silica based layer |
Representative publication
Best representative member for this family based on priority and filing country.
US10093830B2 — Composition for forming a silica based layer, method for manufacturing silica based layer, and electronic device including the silica based layer (published Oct 9, 2018)
Member publications
Related publications in this family.