Photosensitive resin composition, photosensitive element, cured product, semiconductor device, method for forming resist pattern, and method for producing circuit substrate
US-2017329220-A1 · Nov 16, 2017 · US
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Patent family 56074407
This patent family groups 1 related publication across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 56074407 |
| Family type | — |
| Earliest priority | Nov 26, 2014 |
| First filing country | US |
| Member publications | 1 |
| Countries | US |
| Representative publication | US2017329220A1 — Photosensitive resin composition, photosensitive element, cured product, semiconductor device, method for forming resist pattern, and method for producing circuit substrate |
Representative publication
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US2017329220A1 — Photosensitive resin composition, photosensitive element, cured product, semiconductor device, method for forming resist pattern, and method for producing circuit substrate (published Nov 16, 2017)
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