Method for evaluating quality of oxide semiconductor thin film and laminated body having protective film on surface of oxide semiconductor thin film, and method for managing quality of oxide semiconductor thin film
US-9780005-B2 · Oct 3, 2017 · US
This patent family groups 2 related publications across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 55078366 |
| Family type | — |
| Earliest priority | Jul 16, 2014 |
| First filing country | US |
| Member publications | 2 |
| Countries | US |
| Representative publication | US9780005B2 — Method for evaluating quality of oxide semiconductor thin film and laminated body having protective film on surface of oxide semiconductor thin film, and method for managing quality of oxide semiconductor thin film |
Best representative member for this family based on priority and filing country.
US9780005B2 — Method for evaluating quality of oxide semiconductor thin film and laminated body having protective film on surface of oxide semiconductor thin film, and method for managing quality of oxide semiconductor thin film (published Oct 3, 2017)
Related publications in this family.
US-9780005-B2 · Oct 3, 2017 · US
US-2017194218-A1 · Jul 6, 2017 · US