Method for evaluating oxide semiconductor thin film, method for managing quality of oxide semiconductor thin film, and evaluation element and evaluation device used in above evaluation method
US-9816944-B2 · Nov 14, 2017 · US
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Patent family 53273428
This patent family groups 2 related publications across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 53273428 |
| Family type | — |
| Earliest priority | Dec 3, 2013 |
| First filing country | US |
| Member publications | 2 |
| Countries | US |
| Representative publication | US9816944B2 — Method for evaluating oxide semiconductor thin film, method for managing quality of oxide semiconductor thin film, and evaluation element and evaluation device used in above evaluation method |
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US9816944B2 — Method for evaluating oxide semiconductor thin film, method for managing quality of oxide semiconductor thin film, and evaluation element and evaluation device used in above evaluation method (published Nov 14, 2017)
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