Reflective mask blank, method of manufacturing same, reflective mask and method of manufacturing semiconductor device
US-9726969-B2 · Aug 8, 2017 · US
This patent family groups 2 related publications across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 52688678 |
| Family type | — |
| Earliest priority | Sep 18, 2013 |
| First filing country | US |
| Member publications | 2 |
| Countries | US |
| Representative publication | US9726969B2 — Reflective mask blank, method of manufacturing same, reflective mask and method of manufacturing semiconductor device |
Best representative member for this family based on priority and filing country.
US9726969B2 — Reflective mask blank, method of manufacturing same, reflective mask and method of manufacturing semiconductor device (published Aug 8, 2017)
Related publications in this family.
US-9726969-B2 · Aug 8, 2017 · US
US-2016238925-A1 · Aug 18, 2016 · US