Chamber Cleaning and Semiconductor Etching Gases
US-2019027375-A1 · Jan 24, 2019 · US
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Patent family 52283000
This patent family groups 4 related publications across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 52283000 |
| Family type | — |
| Earliest priority | Dec 30, 2013 |
| First filing country | US |
| Member publications | 4 |
| Countries | US |
| Representative publication | US2019027375A1 — Chamber Cleaning and Semiconductor Etching Gases |
Representative publication
Best representative member for this family based on priority and filing country.
US2019027375A1 — Chamber Cleaning and Semiconductor Etching Gases (published Jan 24, 2019)
Member publications
Related publications in this family.
Chamber Cleaning and Semiconductor Etching Gases
US-2018366339-A1 · Dec 20, 2018 · US
Chamber cleaning and semiconductor etching gases
US-10109496-B2 · Oct 23, 2018 · US
Chamber cleaning and semiconductor etching gases
US-2016343579-A1 · Nov 24, 2016 · US