Chemical deposition chamber having gas seal
US-2015004798-A1 · Jan 1, 2015 · US
This patent family groups 1 related publication across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 52116002 |
| Family type | — |
| Earliest priority | Jun 28, 2013 |
| First filing country | US |
| Member publications | 1 |
| Countries | US |
| Representative publication | US2015004798A1 — Chemical deposition chamber having gas seal |
Best representative member for this family based on priority and filing country.
US2015004798A1 — Chemical deposition chamber having gas seal (published Jan 1, 2015)
Related publications in this family.
US-2015004798-A1 · Jan 1, 2015 · US