Monomer, hardmask composition comprising monomer, and pattern forming method using hardmask composition
US-9823566-B2 · Nov 21, 2017 · US
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Patent family 51391466
This patent family groups 2 related publications across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 51391466 |
| Family type | — |
| Earliest priority | Feb 21, 2013 |
| First filing country | US |
| Member publications | 2 |
| Countries | US |
| Representative publication | US9823566B2 — Monomer, hardmask composition comprising monomer, and pattern forming method using hardmask composition |
Representative publication
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US9823566B2 — Monomer, hardmask composition comprising monomer, and pattern forming method using hardmask composition (published Nov 21, 2017)
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